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Method for manufacturing optic wave filtering layer on substrate

A technology for optical filtering and substrates, which is used in optics, optical components, coatings, etc.

Inactive Publication Date: 2011-06-08
SCHOTT AG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this method is limited to use at substrate temperatures below 150°C

Method used

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  • Method for manufacturing optic wave filtering layer on substrate
  • Method for manufacturing optic wave filtering layer on substrate
  • Method for manufacturing optic wave filtering layer on substrate

Examples

Experimental program
Comparison scheme
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Embodiment Construction

[0070] Figures 1A to 1D The process steps involved in making a coated substrate 1 according to a first embodiment of the invention are shown, wherein a schematic cross-sectional view of the substrate 1 is drawn.

[0071] The method of making a segmented substrate 1 with one or more optical filter layers is based on the fact that,

[0072] - making a mask comprising a resist layer on the surface 3 of the substrate 1,

[0073] - depositing an optical filter layer on the surface of the substrate by vacuum deposition, and

[0074] - Swelling the resist layer and removing the resist layer with the optical filter layer.

[0075] according to Figures 1A to 1D This first embodiment of the invention is shown masking the substrate 1 with the resist layer 5 by applying the resist 13, specifically, the application of the resist 13 is computer controlled via the nozzles 9 of the print head 7 , the print head 7 is connected to the computer ( Figure 1A not shown in). This type of prin...

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PUM

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Abstract

The present invention provides a process for producing at least one optical filter layer segment on a substrate. The process includes the following steps: applying a masking comprising a resist layer on a surface of the substrate; depositing an optical filter layer on the surface and the resist layer by vacuum deposition; and removing the resist layer with a portion of the optical filter layer thereon from the surface. The deposition of the optical filter layer, at least at times, takes place at a temperature of over 150 DEG C, preferably in a range from over 150 DEG C. up to and including 400 DEG C.

Description

technical field [0001] The present invention generally relates to fabricating an optical coating with a pattern on a substrate; the present invention specifically relates to fabricating a partitioned patterned optical filter layer on a substrate, in particular a segmented optical filter layer. Background technique [0002] In optical filters, we need domain-segmented optical coatings on substrates, for example, optical rotary filters or color wheels in video projectors. This type of filter sequentially filters different colors of light from a light beam and projects them onto a screen with the aid of a digital micromirror device (DMD). [0003] In sequential filtering, this type of color wheel is divided into segments that filter out different colors, depending on where the color wheel is rotated. In order to produce a flicker-free image of at least video quality, the light must be broken down into different rays of different colors very quickly. This requires fast rotatio...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/20
CPCC23C16/042G02B5/201C23C16/515C23C14/042C23C14/0005
Inventor 迪特·维特博格托马斯·库帕录兹·佐格安德里·米尔坦斯
Owner SCHOTT AG