Photon type diaryl alkene photochromatic material and its prepn and application in double photon light memory

A technology of photochromic materials and perfluorocyclopentene, applied in the direction of color-changing fluorescent materials, chemical instruments and methods, etc.

Inactive Publication Date: 2006-08-02
JIANGXI SCI & TECH NORMAL UNIV
View PDF0 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

So far, there has been no report on the use of m-phenylene substituent perfluorocyclopente

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Photon type diaryl alkene photochromatic material and its prepn and application in double photon light memory
  • Photon type diaryl alkene photochromatic material and its prepn and application in double photon light memory
  • Photon type diaryl alkene photochromatic material and its prepn and application in double photon light memory

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] Embodiment 1: (photochromic compound 1a)

[0025] In the compound molecular structure formula of the photonic m-benzene substituent perfluorocyclopentene diarylene photochromic material, when R is an F atom, it constitutes photochromic compound 1a, and its name is: 1,2 -bis(2-methyl-5-m-fluorophenyl-thiophen-3-yl)perfluorocyclopentene (1a), the structural formula is as follows:

[0026]

[0027] The synthetic scheme Scheme 1 of this novel diaryl perfluorocyclopentene photochromic compound is shown in:

[0028] Scheme 1:

[0029]

[0030] Concrete synthetic steps are as follows:

[0031] 1. 3,5-Dibromo-2-methylthiophene (3):

[0032] Under ice-bath conditions, dissolve 2-methylthiophene (2) in acetic acid, add liquid bromine containing acetic acid dropwise, and continue the ice-bath reaction for 16hr. After that, add water solution, and use Na 2 CO 3 After neutralization, extract with ether, combine the organic phases, and wash with saturated Na2 CO 3 Aqueous...

Embodiment 2

[0048] Embodiment 2: (photochromic compound 2a)

[0049] In the general molecular structure formula of the compound molecular structure of the photonic m-benzene substituent perfluorocyclopentene diarylene photochromic material, when R is -CF 3 When the base is formed, its name is: 1,2-bis(2-methyl-5-m-trifluoromethylphenyl-thiophen-3-yl) perfluorocyclopentene (2a), and its structural formula is as follows:

[0050]

[0051] The synthesis of this novel diaryl perfluorocyclopentene photochromic compound is similar to the synthesis method of 1a in Example 1.

[0052] Yield: 37%.

[0053] Structural identification: m.p.128℃; 1 HNMR (400MHz, CDCl 3 ) δ 2.00 (s, 6H), 7.33 (s, 2H), δ 7.46-7.77 (m, 8H).

[0054] Application: Accurately weigh 100mg of polymethyl methacrylate (PMMA) and ultrasonically dissolve it in 1mL of chloroform, weigh 10mg of compound 2a and mix it into the solution, and make it into a homogeneous glue by ultrasonic treatment. Methods A uniform film with ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Login to view more

Abstract

The present invention discloses one kind of photon type metaphenylene substituted radical perfluoro cyclopentanyl diaryl alkene photochromatic material and its preparation process and use. The photochromatic material has photochromatic performance well maintained in solution and film, excellent chemical and heat stability in both ring-opening state and ring-closing state, obvious fatigue resistance, relatively high cyclization quantum efficiency, high sensitivity and other excellent performance. It has also double photon absorbing characteristic and may be used in double photon storing record with 800 nm laser and used mainly in ultrahigh density double photon information storing.

Description

technical field [0001] The invention relates to the preparation of a photon-type m-benzene substituent perfluorocyclopentene-type diarylene photochromic material and its application in two-photon optical storage. Background technique [0002] With the rapid development of computers and the Internet, the amount of information in the world continues to grow exponentially. How to properly store and retrieve these large amounts of useful information has become an urgent task and an important topic in the field of information technology. For this reason, optical information storage technology emerges as the times require and rises rapidly, becoming a new development direction in the field of informatics after electronic information technology. [0003] Since HD-DVD, since the storage density has approached the diffraction limit determined by the numerical aperture of the objective lens and the laser wavelength, the traditional method of increasing the storage density will become ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C09K9/02
Inventor 蒲守智肖强徐景坤申亮杨天赦刘刚肖伟洪
Owner JIANGXI SCI & TECH NORMAL UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap