Unlock instant, AI-driven research and patent intelligence for your innovation.

Cantilever assembly

A technology of cantilever and components, which is applied to the parts of the instrument, the measurement of mechanical roughness/irregularity, the measurement device, etc., and can solve problems such as difficulties

Inactive Publication Date: 2006-11-29
NANOWORLD
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Conversely, applying traditional masking techniques produces edges with significantly extended
Also, the smaller the size of the cantilever, the more difficult it becomes to align a separate mask, and for very small cantilevers in the micrometer size, it is not feasible to deposit a gold film through a single mask

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Cantilever assembly
  • Cantilever assembly
  • Cantilever assembly

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0035] As shown in FIG. 1 , a specific embodiment of a cantilever assembly 1 according to the present invention includes a cantilever 10 having a cantilever tip 11 for scanning a sample (not shown). The cantilever 10 is attached to a support 12, such as a substrate. The particular embodiment shown is made from a so-called "silicon-on-oxide" wafer, that is, it is made from a wafer comprising three layers: a layer of pure silicon, followed by a layer of silicon oxide, followed by a layer of silicon oxide. This is followed by another layer of pure silicon. In Figure 1, Si and SiO are used respectively 2 to represent these layers.

[0036] On the rear side of the cantilever 10 and in the region of the cantilever tip 11 (this region is referred to below as “back side of the cantilever tip”), a region 110 of a highly reflective material (for example gold) is arranged. A high reflectivity material is a material that has a higher reflectivity than pure silicon. This area 110 is pr...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
lengthaaaaaaaaaa
Login to View More

Abstract

A cantilever assembly (1) comprises a cantilever (10) having a cantilever tip (11). The cantilever is mounted to a rigid support (12, 120, 121) and is provided on its back side with an area (110) of a high reflectance material having a boundary (111) sloping towards the support (12). The extensions (c, Deltac) of the area (110) and of the boundary (111) towards the support fulfil the condition c / Deltac >= 1 wherein c denotes the extension of the area (110) of the high reflectance material in the direction towards the support (12), and Deltac denotes the extension of the sloped boundary (111) of the area (110) of the high reflectance material in the direction towards the support (12).

Description

technical field [0001] The invention relates to a cantilever assembly according to the independent patent claims. Background technique [0002] In atomic force microscopy (AFM) or scanning force microscopy (SFM), locally distributed small forces are measured in order to obtain an image of the sample. This is done with the aid of a cantilever moving across the sample. The end of the cantilever remote from the tip is attached to a rigid support which has a large mass compared to the cantilever. As the cantilever moves across the specimen, forces acting on the tip of the cantilever cause deflection of the cantilever. The offset is detected and processed, and together with information about the corresponding position of the tip relative to the sample, an image of the sample is obtained. [0003] Due to the thermal noise of the cantilever, it is desirable for the cantilever to have a high resonant frequency and low stiffness. This reduces thermal noise and enhances sensitivit...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G12B21/02G12B21/08G01B7/34G01B11/30G01B5/28G01Q20/02G01Q70/16
CPCB82Y35/00G01Q20/02G01Q70/16G01Q70/10Y10T29/49
Inventor 汉斯·J·胡格巴尔特·霍根博姆萨沙·马丁杨晋玲
Owner NANOWORLD