Basal lamina determination device

A technology for measuring devices and substrates, applied in measuring devices, optical testing of flaws/defects, material analysis through optical means, etc., can solve problems such as adjusting the deformation of the shooting mechanism, display device and workbench, to prevent dumping and support easily , the effect of stabilizing support
CN1873373AInactive Publication Date: 2006-12-06SCREEN HLDG CO LTD
2 Cites 6 Cited by

Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
SCREEN HLDG CO LTD
Publication Date
2006-12-06
Estimated Expiration
Not applicable · inactive patent

Smart Images

  • Figure 1
    Figure 1
  • Figure 2
    Figure 2
  • Figure 3
    Figure 3
Patent Text Reader

Abstract

The invention provides a base plate measuring device. Which can rightlt measure enlarged base plate. The metroscope comprise: pedestal (10); objective table (14), which is not stressed by pedestal but is supported by pedestal with its surface inclined a minute angle in relative to vertical direction; guide roller (42) and depressing roll (43), which supports lower part of measured base plate (100); platform (15), which is guided by rail (45) installed on upper and lower of objective table, and moves right and left along objective table surface; camera (18), guided by rail (53) set on platform and move up and down along platform.
Need to check novelty before this filing date? Find Prior Art

Description

technical field

[0001] The present invention relates to a substrate measuring device for measuring substrates such as mask substrates used for producing printed circuit boards and glass substrates for liquid crystal display panels. Background technique

[0002] As one of such substrate measuring devices, a length measuring instrument for measuring the distance between two points on the substrate surface has been used (see Patent Document 1). Such a length measuring instrument adopts a structure in which an imaging unit movable in the X and Y directions is provided along the surface of the stage on which the substrate is mounted, and the imaging unit is used to image the surface of the substrate. The movement amount of the imaging unit at two points is used to measure the distance between the two points.

[0003] However, with the increase in the size of the substrate in recent years, the above-mentioned length measuring instrument has a problem that the substrate placed on ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More