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Determining image blur in an imaging system

An imaging system, a fuzzy technology, applied in the photoengraving process, optics, instruments, etc. of the pattern surface, which can solve the problems of ignorance and so on

Inactive Publication Date: 2007-02-28
KONINKLIJKE PHILIPS ELECTRONICS NV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the fitting process, these conditions of the imaging system must be taken into account, but these conditions are often not known

Method used

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  • Determining image blur in an imaging system
  • Determining image blur in an imaging system
  • Determining image blur in an imaging system

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Experimental program
Comparison scheme
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Embodiment Construction

[0048]Fig. 1 schematically shows the most important optical elements of an embodiment of an imaging system IS, which is a lithographic apparatus for repeatedly imaging a mask pattern on a substrate. The device comprises a projection barrel housing a projection lens system PL. Located above the system is a mask holder MH housing a mask MA in which a mask pattern C to be imaged, eg an IC pattern, is provided. The mask holder is located in the mask table MT. The substrate table WT is placed below the projection lens system PL in the projection column. The substrate table supports a substrate holder WH for receiving a substrate W, such as a semiconductor substrate, also called a wafer. The substrate has a radiation sensitive layer, called resist layer PR, on which the mask pattern has to be imaged several times, each time in a different IC area Wd. As shown, the substrate stage is movable in the X and Y directions so that after imaging the mask pattern on one IC region, the fol...

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PUM

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Abstract

The invention relates to a method of determining a parameter relating to image blur in an imaging system (IS) comprising the step of illuminating an object having a test pattern (MTP) by means of the imaging system (IS), thereby forming an image of the test pattern,. The test pattern (MTP) has a size smaller than the resolution of the imaging system (IS), which makes the image of the test pattern independent of illuminator aberrations. The test pattern (MTP) is an isolated pattern, which causes the image to be free of optical proximity effects. The image is blurred due to stochastic fluctuations in the imaging system and / or in the detector detecting the blurred image. The parameter relating to the image blur is determined from a parameter relating to the shape of the blurred image. According to the invention, resist diffusion and / or focus noise may be characterized. In the method of designing a mask, the parameter relating to the image blur due to diffusion in the resist is taken into account. The computer program according to the invention is able to execute the step of determining the parameter relating to the image blur from a parameter relating to a shape of the blurred image.

Description

field of invention [0001] The present invention relates to determining parameters related to image blur in an imaging system. [0002] The invention also relates to the design of masks used in photolithography processes. [0003] The invention also relates to a computer program for implementing a method of determining parameters related to image blur in an imaging system. [0004] The invention relates to a device for determining parameters related to image blur in an imaging system. technical background [0005] In British Patent Application GB-A-2,320,768 a method for determining parameters relating to image blur in an imaging system is disclosed. In this known method, process parameters of a photolithographic process for patterning a resist layer are determined. The known method comprises the steps of irradiating a resist layer using an imaging system through a mask having a mask pattern, developing the irradiated resist layer to form a pattern, and determining process...

Claims

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Application Information

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IPC IPC(8): G03F7/20
CPCG03F7/70608G03F7/706G03F7/7085
Inventor 彼得·迪克森奥古斯图斯·J.·E.·M.·扬森约瑟夫斯·J.·M.·布拉特阿德里安·莱韦斯泰因
Owner KONINKLIJKE PHILIPS ELECTRONICS NV