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Heat-resistant resin laminated film, multilayer film with metal layer including same, and semiconductor device

A technology of heat-resistant resin and laminated film, which can be applied to metal layered products, synthetic resin layered products, electronic equipment, etc., can solve problems such as increasing the productivity of processes, etc., and achieve the effect of high reliability

Inactive Publication Date: 2007-03-14
TORAY IND INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

With such a configuration, although the warping of the substrate after copper layer etching can be suppressed, there are problems in terms of productivity such as additional steps

Method used

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  • Heat-resistant resin laminated film, multilayer film with metal layer including same, and semiconductor device
  • Heat-resistant resin laminated film, multilayer film with metal layer including same, and semiconductor device
  • Heat-resistant resin laminated film, multilayer film with metal layer including same, and semiconductor device

Examples

Experimental program
Comparison scheme
Effect test

manufacture example 1

[0147] Add 12.43g (0.05mol) of SiDA and 50.05g (0.25mol) of DAE together with 2450g of NMP in a reaction kettle equipped with a thermometer, a dry nitrogen inlet, a heating and cooling device with warm water and cooling water, and a stirring device After dissolving 75.67g (0.7mol) of PDA, 294.2g (1mol) of BPDA was added and reacted at 70°C for 6h to obtain a 15% by weight polyamic acid resin solution (PA1). The linear expansion coefficient of the resin imidated from the polyamic acid resin solution (PA1) was 20 ppm / °C, the water absorption was 1.1% by weight, and the glass transition temperature was 283°C.

manufacture example 2-7

[0149] Except changing the type and addition amount of carboxylic dianhydride and diamine according to Table 1, the same operation was performed as in Production Example 1 to obtain a 15% by weight polyamic acid resin solution (PA2-7). Table 1 shows the coefficient of linear expansion, water absorption, and glass transition temperature of resins imidized from polyamic acid resin solutions (PA2-7).

manufacture example 8

[0151] Except for changing the type and addition amount of carboxylic dianhydride and diamine according to Table 1, the same operation was performed as in Production Example 1 to obtain a 15% by weight polyamic acid resin solution (PA8). Table 1 shows the coefficient of linear expansion, water absorption and glass transition temperature of the resin imidized from the polyamic acid resin solution (PA8).

[0152] Tetracarboxylic acid component

Diamine component

solvent

DMAc

Linear expansion coefficient

(ppm / °C)

water absorption

(weight%)

vitrification

transition temperature

(℃)

BPDA

OPDA

SiDA

DAE

PDA

DABA

m-TB

Manufacturing example 1

PA1

1.00

294.20

0.05

12.43

0.25

50.05

0.70

75.67

2450

20

1.1

283

Manufacturing example 2

PA2

1.00

294.20

0.40

8...

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Abstract

Disclosed are a heat-resistant resin laminate film comprising a heat-resistant insulating film such as a polyimide film and a heat-resistant resin layer laminated thereon, which laminate film is free from warp; and a laminate film with a metal layer, comprising a heat-resistant insulating film and a metal layer laminated thereon through a heat-resistant resin layer, which laminate film with a metal layer is free from warp in the state that a circuit pattern is formed. In the heat-resistant resin laminate film, a heat-resistant resin layer is laminated on at least one surface of the heat-resistant insulating film, wherein the heat-resistant resin layer has a coefficient of linear expansion kA (ppm / °C) within the range of k-10‰¤kA‰¤k+20 (k: coefficient of linear expansion of the heat-resistant insulating film). The laminate film with a metal layer is one obtained by laminating the metal layer on the heat-resistant resin layer of the heat-resistant resin laminate film.

Description

technical field [0001] The present invention relates to a laminated film of a heat-resistant resin laminated film and a metal-clad layer containing it, and a semiconductor device. More specifically, the present invention relates to a method for manufacturing a metal-clad laminated film used in a flexible printed circuit board (FPC) widely used in the electronic industry, and to a tape used as a mounting method for a semiconductor integrated circuit (IC). Metal-clad laminated films used in automatic bonding (TAB), chip-on-film (COF), etc., semiconductor devices using them, and methods of manufacturing metal-clad laminated films. Background technique [0002] In recent years, the miniaturization and weight reduction of electronic devices has accelerated. Along with the progress of higher density and higher performance of semiconductor integrated circuits, miniaturization and higher performance of FPC wiring patterns are required. [0003] In the past, TAB was used in the mou...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B32B27/34B32B15/08H05K1/03H05K1/00
CPCB32B2307/306H05K1/0393B32B2307/206B32B2307/734H05K2201/0355B32B2250/02B32B15/20B32B2457/08B32B15/08H05K2201/068B32B2307/308H05K1/036H05K2201/0154B32B2457/14B32B27/281Y10T428/31504Y10T428/31511Y10T428/31678Y10T428/31721
Inventor 渡边拓生松本悠
Owner TORAY IND INC