Method and device for detecting arcs

An arc and arc detection technology, applied in the direction of measuring electrical variables, testing dielectric strength, measuring current/voltage, etc.

Inactive Publication Date: 2007-06-27
HUETTINGER ELEKTRONIK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This measuring device is embedded in a circuit whose master is located in the control unit of the generator, where, in ...

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  • Method and device for detecting arcs
  • Method and device for detecting arcs

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Embodiment Construction

[0035]FIG. 1 shows an arc detection device 1 . An evaluation signal is applied to the input 2, either from an AC generator or from a direct measurement at the electrodes of the plasma process chamber. The evaluation signal can be, for example, an AC voltage generated by an AC generator, or an internal signal of the AC voltage generator. In the present embodiment, this signal is applied to one input of each analog-to-digital converter (ADC) 3, 4, 5, 6, 25, said ADC being designed as a comparator. The evaluation signal is also supplied to a peak rectifier 7 comprising a diode 8 , a resistor 9 and a capacitor 10 . In the peak rectifier 7 the amplitude UA is determined, which is an average of several cycles of the evaluation signal. In this embodiment, the voltage is determined. The voltage is applied to a reference value generating device 11 designed as a voltage divider. The resistors 12, 13, 14, 15 of the reference value generating device 11 are of equal size. This means t...

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Abstract

An arc detection means for detecting arcs in a plasma process includes at least one comparator to which an evaluation signal such as an output signal or an internal signal of an AC generator relating to the output signal and a reference value are supplied. The comparator is connected to a logic component that generates a signal for an arc suppression device.

Description

technical field [0001] The invention relates to a method for detecting arcs in a plasma process supplied by an AC generator, an output signal of which is used for power supply. Background technique [0002] The coating of substances (for example glass surfaces) by sputtering / cathode sputtering in the conventional reactive manner in the plasma process is known in the coating of architectural glass. For this purpose, a current source or a voltage source generates a plasma which removes substances deposited on the substrate (for example a glass panel) from the target. Before deposition, the atoms can be confined as gas atoms or gas molecules during the reaction, depending on the desired coating. [0003] MF generators, typically operating at frequencies from 10 to 500 kHz, are often used, especially for reactive processes. Typically the output voltage of the MF generator is supplied to two electrodes of the plasma process chamber which operate alternately as cathode and anode...

Claims

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Application Information

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IPC IPC(8): G01R17/00G01R19/00C23C14/34C23C14/54H01J37/34H02H7/00H05H1/46
CPCH01J37/3444G01R19/0061G01R31/12H01J37/34H01J2237/0206
Inventor 斯文·阿克森贝克马库斯·班瓦尔特梅尔廷·施托伊贝尔彼得·维德姆特洛塔尔·沃尔夫
Owner HUETTINGER ELEKTRONIK
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