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Exposure apparatus and method for producing device

a technology of exposure apparatus and production device, which is applied in the direction of microlithography exposure apparatus, printers, instruments, etc., can solve the problems of any other alignment system, and achieve the effect of wide depth of focus, correct and easy execution of substrate positioning, and wide depth of focus

Inactive Publication Date: 2006-07-13
NIKON CORP
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  • Abstract
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AI Technical Summary

Benefits of technology

The present invention provides a liquid immersion exposure apparatus and method for exposing a substrate by transferring an image of a pattern through a liquid onto the substrate. The apparatus and method allow for accurate pattern transfer and optimal positional alignment between the substrate surface and the image plane of the pattern, even when the space between the projection optical system and the substrate is filled with liquid. This is achieved by detecting surface information about the substrate surface and adjusting the positional relationship between the substrate surface and the image plane of the pattern based on the detected surface information. The apparatus and method can use existing detection systems without needing to construct any additional alignment systems in response to the liquid immersion. The technical effects of the invention include improved accuracy in pattern transfer and positional alignment, as well as simplified and efficient operation.

Problems solved by technology

Further, it is unnecessary to construct any other alignment system in order to respond to the liquid immersion.

Method used

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  • Exposure apparatus and method for producing device
  • Exposure apparatus and method for producing device
  • Exposure apparatus and method for producing device

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Embodiment Construction

[0026] An explanation will be made below about the exposure apparatus and the method for producing the device according to the present invention. FIG. 1 shows a schematic arrangement illustrating an embodiment of the exposure apparatus of the present invention.

[0027] With reference to FIG. 1, an exposure apparatus EX includes a mask stage MST which supports a mask M, a substrate stage PST which supports a substrate P, an illumination optical system IL which illuminates, with an exposure light beam EL, the mask M supported by the mask stage MST, a projection optical system PL which performs projection exposure for the substrate P supported by the substrate stage PST with an image of a pattern of the mask M illuminated with the exposure light beam EL, and a control unit CONT which collectively controls the overall operation of the exposure apparatus EX.

[0028] The embodiment of the present invention will now be explained as exemplified by a case of the use of the scanning type exposu...

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Abstract

An exposure apparatus performs exposure for a substrate by filling a space between a projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate through the liquid by using the projection optical system. The exposure apparatus includes a substrate stage for holding the substrate, a liquid supply unit for supplying the liquid to a side of an image plane of the projection optical system, and a focus / leveling-detecting system for detecting surface information about a surface of the substrate not through the liquid. The exposure apparatus performs liquid immersion exposure for the substrate while adjusting a positional relationship between the surface of the substrate and the image plane formed through the projection optical system and the liquid, on the basis of the surface information detected by the focus / leveling-detecting system. The liquid immersion exposure can be performed at a satisfactory pattern transfer accuracy.

Description

CROSS-REFERENCE [0001] This is a Divisional of U.S. patent application Ser. No. 11 / 141,518 filed Jun. 1, 2005, which in turn is a Continuation of International Application No. PCT / JP03 / 015667 filed Dec. 8, 2003 claiming the conventional priority of Japanese patent Application No. 2002-357962 filed on Dec. 10, 2002. The disclosures of these applications are incorporated by reference herein in their entireties.BACKGROUND OF THE INVENTION [0002] 1. Field of the Invention [0003] The present invention relates to a liquid immersion exposure apparatus and a liquid immersion exposure method for performing the exposure with an image of a pattern projected by a projection optical system in a state in which at least a part of a space between the projection optical system and a substrate is filled with a liquid. The present invention also relates to a method for producing a device by using the exposure apparatus. [0004] 2. Description of the Related Art [0005] Semiconductor devices and liquid c...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): G03B27/42G03F7/20G03F9/00
CPCG03F7/70341G03F9/7011G03F9/7015G03F9/7019G03F9/7034G03F9/7046G03F9/7088G03F9/7096
Inventor NEI, MASAHIROKOBAYASHI, NAOYUKICHIBA, HIROSHIHIRUKAWA, SHIGERU
Owner NIKON CORP
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