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Illumination system

Inactive Publication Date: 2007-06-07
ASML NETHERLANDS BV +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this can lead to light that is not uniform in intensity or other characteristics across all the beams.
When trying to homogenize these light beams in conventional systems, interference problems can arise due to the overlap of coherent beams.

Method used

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Examples

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Embodiment Construction

[0020] While specific configurations and arrangements are discussed, it should be understood that this is done for illustrative purposes only. A person skilled in the pertinent art will recognize that other configurations and arrangements can be used without departing from the spirit and scope of the present invention. It will be apparent to a person skilled in the pertinent art that this invention can also be employed in a variety of other applications.

[0021]FIG. 1 schematically depicts the lithographic apparatus of one embodiment of the invention. The apparatus comprises an illumination system IL, a patterning device PD, a substrate table WT, and a projection system PS. The illumination system (illuminator) IL is configured to condition a radiation beam B (e.g., UV radiation).

[0022] The patterning device PD (e.g., a reticle or mask or an array of individually controllable elements) modulates the beam. In general, the position of the array of individually controllable elements wi...

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PUM

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Abstract

A system and method are used to substantially homogenizing and removing at least some coherence from a beam of light.

Description

BACKGROUND [0001] 1. Field of the Invention [0002] The present invention relates to an optical apparatus, suitable for use as part of a lithographic apparatus. [0003] 2. Related Art [0004] A lithographic apparatus is a machine that applies a desired pattern onto a substrate or part of a substrate. A lithographic apparatus can be used, for example, in the manufacture of flat panel displays, integrated circuits (ICs) and other devices involving fine structures. In a conventional apparatus, a patterning device, which can be referred to as a mask or a reticle, can be used to generate a circuit pattern corresponding to an individual layer of a flat panel display (or other device). This pattern can be transferred onto all or part of the substrate (e.g., a glass plate), by imaging onto a layer of radiation-sensitive material (resist) provided on the substrate. [0005] Instead of a circuit pattern, the patterning means can be used to generate other patterns, for example a color filter patter...

Claims

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Application Information

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IPC IPC(8): G03B27/72
CPCG02B27/0905G03F7/70075G03F7/70583
Inventor VISSER, HUIBERTKLINKHAMER, JACOB FREDRIK FRISORYZHIKOV, LEVCOSTON, SCOTT D.JOOBEUR, ADELSHMAREV, YEVGENIY KONSTANTINOVICHVINK, HENRI JOHANNES PETRUS
Owner ASML NETHERLANDS BV