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Vibration Isolation Device, Arithmetic Apparatus, Exposure Apparatus, and Device Manufacturing Method

a technology of vibration isolation device and arithmetic apparatus, which is applied in the direction of photomechanical apparatus, instruments, printers, etc., can solve the problems of prolonging the time taken to recover the vibration isolation device, and taking a lot of time to investigate the cause of abnormalities

Inactive Publication Date: 2010-01-07
CANON KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The device effectively avoids faults caused by seismic vibrations by switching between isolation modes, ensuring accurate control and reducing the risk of structural contact, thereby enhancing vibration isolation performance and reducing recovery time.

Problems solved by technology

This increases a risk that when seismic vibration occurs, a structure supporting a shaking vibration isolation device would come into contact with a structure, which is supported by the device and is absolutely still, due to the propagation of surface waves with ultralow frequencies, which have been thought to have no adverse influence on various structures up to now.
If a vibration isolation device suffers from an abnormality due to the propagation of such surface waves, which humans cannot feel, a lot of time is taken to investigate the cause of the abnormality.
This prolongs the time taken to recover the vibration isolation device.

Method used

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  • Vibration Isolation Device, Arithmetic Apparatus, Exposure Apparatus, and Device Manufacturing Method
  • Vibration Isolation Device, Arithmetic Apparatus, Exposure Apparatus, and Device Manufacturing Method
  • Vibration Isolation Device, Arithmetic Apparatus, Exposure Apparatus, and Device Manufacturing Method

Examples

Experimental program
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Effect test

first embodiment

[0027]An exposure apparatus according to the first embodiment will be explained first. FIG. 4 shows the schematic arrangement of the exposure apparatus according to this embodiment. FIG. 5 shows the arrangement and layout of a vibration isolation device built in the exposure apparatus.

[0028]As shown in FIGS. 4 and 5, a main body structure 403 of the exposure apparatus mounts a reticle stage 404, serving as an original stage, a wafer stage base 405, and a projection lens group 401. The main body structure 403 also mounts a wafer stage 407, serving as a substrate stage, via the wafer stage base 406. A laser irradiation unit 413 includes a light source, which emits a laser beam, and a mirror. A wafer is irradiated with, for example, a KrF or an ArF laser beam from the laser irradiation unit 413 via a reticle and the projection lens group 401, thereby printing the reticle pattern on the wafer. The main body structure 403 is supported by the vibration isolation devices.

[0029]A vibration ...

second embodiment

[0074]In the first embodiment, a seismic warning network is formed by forming a network of seismic stations using exposure apparatuses. The second embodiment will exemplify a case in which a seismic warning network is formed using a public network of seismic stations. The arrangement of an exposure apparatus according to the second embodiment is the same as that (FIGS. 4 and 5) in the first embodiment.

[0075]The outline of a seismic warning network according to the second embodiment will be explained. FIG. 2 shows the outline of the seismic warning network according to the second embodiment.

[0076]Referring to FIG. 2, seismic observation devices 202a to 202f and exposure apparatuses 201a to 201c, in respective regions around the world are connected to communication networks 206 and 207, respectively, such as the Internet or a satellite communication network. When the seismic vibration occurs at a hypocenter 102, the seismic observation device 202a at a spot to which seismic vibration ...

third embodiment

[0081]An embodiment of a system which issues a warning to the operator of a vibration isolation device based on the magnitude of an earthquake, the depth of a hypocenter, the hypocentral position, and the occurrence time of the earthquake announced by a research institute will be explained next. If an exposure apparatus according to this embodiment determines that seismic vibration will adversely affect the exposure apparatus or isolation vibration device, it notifies its operator of information associated with this determination. This information is recorded in the apparatus or a management system of the apparatus.

[0082]As an earthquake occurs, the network of seismic stations or meteorological institute described in the first and second embodiments announces pieces of information on the magnitude of the earthquake, the depth of the hypocenter, the hypocentral position, and the occurrence time of the earthquake.

[0083]Referring to FIG. 2, an arithmetic apparatus 203 receives informat...

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Abstract

An arithmetic apparatus connected to a communication net connected to a vibration isolation device. The apparatus includes a reception unit that receives seismic information via the communication net from a seismic observation device, an estimation unit that estimates seismic vibration which will arrive at the vibration isolation device, on the basis of the seismic information received by the reception unit, and a transmission unit that transmits information on the seismic vibration estimated by the estimation unit to the vibration isolation device via the communication net.

Description

[0001]This application is a continuation of copending U.S. patent application Ser. No. 12 / 060,587, filed Apr. 1, 2008.[0002]This application also claims the benefit of Japanese Patent Application No. 2007-101045, filed Apr. 6, 2007, which is hereby incorporated by reference herein in its entirety.BACKGROUND OF THE INVENTION[0003]1. Field of the Invention[0004]The present invention relates to a vibration isolation device, an arithmetic apparatus, an exposure apparatus, and a device manufacturing method.[0005]2. Description of the Related Art[0006]Active vibration isolation devices (to be simply referred to as vibration isolation device hereafter) are classified into an absolute vibration damping type and a relative vibration damping type. A vibration isolation device of the former type dampens vibration of a structure with respect to an absolutely still point using, for example, a skyhook damper scheme or a skyhook spring scheme. A vibration isolation device of the latter type dampen...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): G01V1/28G03B27/00
CPCF16F15/02G03F7/709
Inventor SHIBAYAMA, TAKASHIMAYAMA, TAKEHIKOUKAJI, TAKAO
Owner CANON KK