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Nanotube application deposition system for forming low defect nanotube fabrics

a nanotube and application deposition system technology, applied in the field of nanotube solution, nanotube film or fabric formation, can solve the problems that the solution made from raw nanotubes cannot be used in a semiconductor fabrication plant, negatively affecting the electrical properties of the nanotube film or fabric, etc., and achieves the effect of low impurity and defect levels

Inactive Publication Date: 2017-08-31
ZEON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Typically, solutions made from raw nanotubes cannot be used in a semiconductor fabrication plant, because raw nanotubes may contain undesirable impurities, such as amorphous carbon, metal, etc., which would negatively impact the electrical properties of the nanotube film or fabric fabricated therefrom.

Method used

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  • Nanotube application deposition system for forming low defect nanotube fabrics
  • Nanotube application deposition system for forming low defect nanotube fabrics
  • Nanotube application deposition system for forming low defect nanotube fabrics

Examples

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Embodiment Construction

[0043]The present disclosure teaches methods for forming low defect nanotube application solutions that can be, in turn, used to provide nanotube fabrics with very low levels of both impurities and defects. As will be described in detail below, one or more defect reduction processes can be used to remove air bubbles, small scale defects, and large scale defects from a nanotube application solution and prevent defects from being transferred in a nanotube fabric formed from such a solution. According to the methods of the present disclosure, defect reduction processes include: a degassing process, a continuous flow centrifugation (CFC) process, a bulk centrifugation process, and processing through a depth filter. In one aspect of the present disclosure a degassing process is used to remove dissolved gases (such as O2 or CO2) from a suspension of nanotubes. In certain applications, the presence of air bubbles within a suspension of nanotubes can facilitate nanotube elements “clumping” ...

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Abstract

The present disclosure provides methods for removing defects nanotube application solutions and providing low defect, highly uniform nanotube fabrics. In one aspect, a degassing process is performed on a suspension of nanotubes to remove air bubbles present in the solution. In another aspect, a continuous flow centrifugation (CFC) process is used to remove small scale defects from the solution. In another aspect, a depth filter is used to remove large scale defects from the solution. According to the present disclosure, these three methods can be used alone or combined to realize a low defect nanotube application solutions and fabrics.

Description

CROSS-REFERENCE TO RELATED APPLICATIONS[0001]This application is a divisional application of and claims priority to U.S. patent application Ser. No. 14 / 265,602, entitled “ Low Defect Nanotube Application Solutions and Fabrics and Methods for Making Same,” filed Apr. 30, 2014, the entire contents of which are incorporated herein by reference, which claims the benefit of priority to U.S. Provisional Application No. 61 / 818,417, entitled “Low Defect Nanotube Application Solutions And Fabrics And Methods Of Making Same,” filed on May 1, 2013, the entire contents of which are incorporated herein by reference.[0002]This application relates to the following U.S. patents, which are assigned to the assignee of this application, and are hereby incorporated by reference in their entirety: Methods of Nanotube Films and Articles (U.S. Pat. No. 6,835,591), filed Apr. 23, 2002;[0003]Methods of Using Pre-Formed Nanotubes to Make Carbon Nanotube Films, Layers, Fabrics, Ribbons, Elements, and Articles...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): B01D19/00D04H1/4242B05D7/24D04H1/732
CPCB01D19/0005D04H1/732D04H1/4242B05D7/24B05D1/005B01D19/0036B01D19/0031B01D19/0057B01D19/0078Y10T442/60B05D3/002B05D3/12Y10S977/845Y10S977/892B05C9/10B05C13/02B05C19/06H10K85/221
Inventor KOCAB, J. THOMASBENGTSON, THOMASHOSIC, SANJINSEN, RAHULSMITH, BILLYROBERTS, DAVID A.SITES, PETER
Owner ZEON CORP
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