Nanotube application deposition system for forming low defect nanotube fabrics
a nanotube and application deposition system technology, applied in the field of nanotube solution, nanotube film or fabric formation, can solve the problems that the solution made from raw nanotubes cannot be used in a semiconductor fabrication plant, negatively affecting the electrical properties of the nanotube film or fabric, etc., and achieves the effect of low impurity and defect levels
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[0043]The present disclosure teaches methods for forming low defect nanotube application solutions that can be, in turn, used to provide nanotube fabrics with very low levels of both impurities and defects. As will be described in detail below, one or more defect reduction processes can be used to remove air bubbles, small scale defects, and large scale defects from a nanotube application solution and prevent defects from being transferred in a nanotube fabric formed from such a solution. According to the methods of the present disclosure, defect reduction processes include: a degassing process, a continuous flow centrifugation (CFC) process, a bulk centrifugation process, and processing through a depth filter. In one aspect of the present disclosure a degassing process is used to remove dissolved gases (such as O2 or CO2) from a suspension of nanotubes. In certain applications, the presence of air bubbles within a suspension of nanotubes can facilitate nanotube elements “clumping” ...
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