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Exposure apparatus, manufacturing method of flat-panel display, device manufacturing method, and exposure method

a technology of flat-panel display and manufacturing method, which is applied in the direction of microlithography exposure apparatus, photomechanical treatment, instruments, etc., can solve the problem of difficulty in preparing a scale that can cover the entire movement range of a substra

Inactive Publication Date: 2018-12-13
NIKON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The present invention provides an exposure apparatus for exposing an object with an illumination light via a projection optical system. The apparatus includes a holding section for holding the object, a position measurement section including a measuring section and a measured section, and a first drive section that relatively moves one of the measuring section and the measured section on the holding section, with respect to the other of the measuring section and the measured section. The position measurement section can acquire position information of the holding section based on an output of the measuring section, which ensures accurate exposure of the object. The invention also provides a manufacturing method of a flat-panel display and a device manufacturing method using the exposure apparatus, which improves the manufacturing process of the display. Additionally, the invention provides an exposure method using the exposure apparatus, which ensures accurate exposure of the object.

Problems solved by technology

Further, although the influence of the air fluctuation can be reduced by using an encoder system, it is difficult to prepare a scale that can cover the entire movement range of a substrate due to the increase in size of the substrate in recent years.

Method used

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  • Exposure apparatus, manufacturing method of flat-panel display, device manufacturing method, and exposure method
  • Exposure apparatus, manufacturing method of flat-panel display, device manufacturing method, and exposure method
  • Exposure apparatus, manufacturing method of flat-panel display, device manufacturing method, and exposure method

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first embodiment

[0027]A first embodiment will be described below, using FIGS. 1 to 10B.

[0028]FIG. 1 schematically shows the configuration of a liquid crystal exposure apparatus 10 related to the first embodiment. Liquid crystal exposure apparatus 10 is a projection exposure apparatus of a step-and-scan method, which is a so-called scanner, with a rectangular (square) glass substrate P (hereinafter, simply referred to as a substrate P) used in, for example, a liquid crystal display device (a flat-panel display) or the like, serving as an object to be exposed.

[0029]Liquid crystal exposure apparatus 10 has: an illumination system 12; a mask stage device 14 to hold a mask M on which patterns such as a circuit pattern are formed; a projection optical system 16; an apparatus main body 18; a substrate stage device 20 to hold substrate P whose surface (a surface facing the +Z side in FIG. 1) is coated with resist (sensitive agent); a control system thereof; and the like. Hereinafter, the explanation is giv...

second embodiment

[0094]Next, a liquid crystal exposure apparatus related to a second embodiment will be described using FIGS. 11A to 11C. The configuration of the liquid crystal exposure apparatus related to the second embodiment is the same as that in the first embodiment described above except that the configuration of a substrate encoder system 150 is different. Therefore, only the differences will be described below, and elements that have the same configurations and functions as those in the first embodiment described above will be provided with the same reference signs as those in the first embodiment described above, and the description thereof will be omitted.

[0095]In the first embodiment described above, a configuration is employed in which the step movement of the pair of head units 60, that substrate stage device 20 (substrate holder 34) has, in a direction opposite to substrate P is performed at the time the Y-step operation of substrate P, and the pair of head units 60 are moved integra...

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Abstract

A liquid crystal exposure apparatus that exposes a substrate with an illumination light via a projection optical system is equipped with: a substrate holder that holds the substrate; a substrate encoder system that includes head units and scales, and acquires the position information of the substrate holder on the basis of the output of the head units; and a drive section that relatively moves one of the head units and the scales on the substrate holder with respect to the other.

Description

TECHNICAL FIELD[0001]The present invention relates to exposure apparatuses, manufacturing methods of flat-panel displays, device manufacturing methods and exposure methods, and more particularly to an exposure apparatus and an exposure method for exposing an object with an illumination light, and a manufacturing method of flat-panel displays or a device manufacturing method using the exposure apparatus.BACKGROUND ART[0002]Conventionally, in a lithography process for manufacturing electronic devices (micro devices) such as liquid crystal display devices and semiconductor devices (integrated circuits and the like), used are exposure apparatuses such as an exposure apparatus of a step-and-scan method (a so-called scanning stepper (which is also called a scanner)) that, while synchronously moving a mask (a photomask) or a reticle (hereinafter, generically referred to as a “mask”) and a glass plate or a wafer (hereinafter, generically referred to as a “substrate”) along a predetermined s...

Claims

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Application Information

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IPC IPC(8): G03F7/20
CPCG03F7/70775G03F7/70791G03F7/70833G03F7/20G03F7/706G01D5/34746G03F7/7085
Inventor AOKI, YASUOHARA, ATSUSHISHIMOYAMA, TAKACHIKAKAWAGUCHI, TORUSHIMATAKE, KATSUHIRONODA, IORI
Owner NIKON CORP