Substrate treating apparatus

Abstract

The present invention provides a substrate treatment apparatus by which the influence of a treatment unit for carrying out prescribed treatment is reliably removed from a substrate which does not require the prescribed treatment. As the carrying paths of the substrate, the substrate treatment apparatus 1 is provided with a main carrying path MTR via an etching unit 50 and a peeling unit 51, a sub carrying path STR1 (conveyer 30) by-passing the etching unit 50, and a sub carrying path STR2 (buffer 41) by-passing the peeling unit 51. In addition, the substrate treatment apparatus 1 is provided with a carrying robot 20 or 22 for receiving and delivering the substrate between the main carrying path MTR and the sub carrying paths STR1 and STR2. For example, the substrate which is not to be etched is by-passed to carry the etching unit 50 by selecting the sub carrying path STR1 by a control unit 80 and carrying the substrate to the conveyer 30 by the carrying robot 20.

Description

technical field [0001] The present invention relates to a substrate processing apparatus that transports a substrate while excluding the influence of a processing unit provided therein on the substrate. Background technique [0002] In the prior art, a substrate processing apparatus has been proposed. In the substrate manufacturing process, processing units that perform a series of processes are provided along a substrate conveyance path, and the substrate is conveyed along the conveyance path while being processed by those processing units. For example, Patent Document 1 describes such a substrate processing apparatus. [0003] In the substrate processing apparatus described in Patent Document 1, there is only one transport path for substrates, and all substrates are transported by the same path. Therefore, even a substrate that is to be excluded from processing by a specific processing unit on the transport path (a substrate that is not subjected to the processing) must b...

AI Technical Summary

Problems solved by technology

When transporting substrates into such a processing unit, even if the substrates are transported out without performing the processing of the processing unit itself, there is a problem that the chemical solution will affect the substrates that do not need to be processed originally.

[0006] In addition, even if one of the processing units on the transport path cannot transport the substrate, all the substrates will be in an untransportable state, and there is a problem that this effect will also occur on the substrate that does not need to be processed by the processing unit.

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