Regulating apparatus and regulating method for slit spray nozzle front end
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- 艾美柯技术株式会社
- Publication Date
- 2009-01-14
Smart Images
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Abstract
Description
technical field
[0001] The invention relates to an adjusting device and an adjusting method for adjusting the front end of a slit nozzle. Background technique
[0002] Conventionally, in order to apply a resist or the like on the surface of a plate-shaped object to be processed such as a semiconductor wafer or a glass substrate, the coating liquid is dripped from a nozzle to the center of the object to be processed placed on a spinner, and the object to be processed is passed through the spinner. The centrifugal force generated by the rotation spreads the coating liquid outward. However, in this method, the remaining coating liquid on the surface of the object to be treated is very little, and almost all of it is scattered and wasted. Therefore, instead of spinner coating, it is conceivable to open a coating liquid discharge port of a predetermined width in the nozzle itself, and apply a coating liquid of a predetermined width to the surface of the object to be treated by mo...