Clean container latching structure

A technology for cleaning containers and fasteners, used in semiconductor/solid-state device manufacturing, clamping devices, closing, etc., can solve the problem of adding parts, unfavorable cleaning and drying operations of photomask boxes, and easy accumulation of fasteners and metal covers Micro dust and other problems, to reduce frictional resistance, improve the reliability and cleanliness of the buckle, avoid elastic fatigue and no metal components

Inactive Publication Date: 2009-09-23
IND TECH RES INST
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

And this prior art and Figure 1A Like the existing technology, there are too many dead angles between the fastening parts and the metal cover, which is not only easy to accumulate fine dust, but also not conducive to the cleaning and drying of the mask box.
This prior art will also increase the number of parts (the total number of parts is 14 in the fastening mechanism), which is not very ideal

Method used

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  • Clean container latching structure
  • Clean container latching structure
  • Clean container latching structure

Examples

Experimental program
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Embodiment Construction

[0061] The preferred embodiments of the present invention are described in detail below with reference to the drawings.

[0062] First please refer to figure 2 The three-dimensional exploded view of the illustrated embodiment of the fastening structure of the clean container of the present invention, image 3 depicted figure 2 The three-dimensional exploded view of the fastening piece and the housing groove of the cover, Figure 4 A perspective view of the first embodiment of the fastening member and the elastic auxiliary arm of the clean container fastening structure of the present invention is shown. Among them, the fastening structure of the clean container 20 in the embodiment of the present invention mainly utilizes one or more fastening parts 50, which are detachably combined with the cover 40 of the clean container in an embedded manner, so that the cover 40 can be connected with the clean The seat body 30 of the container performs the operation of fastening or ope...

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PUM

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Abstract

The invention discloses a fastening structure for a clean container. A detachable fastening piece is combined with a cover of the clean container so that the cover can be closed or opened on the seat of the clean container. The fastening piece includes an integrally formed main body. , a positioning part and an elastic buckle arm, the positioning part extends from one side of the main body to form a shrapnel, and the shrapnel has a flange to fasten the fastener on the cover, the elastic buckle arm has an elastic arm, and its end has a side To the flange, the lateral flange extends into the seat to form a snap-fit ​​state. The fastening part can further include an elastic auxiliary arm formed between the elastic arm and the main body to increase the elastic strength of the elastic buckle arm. The fastening structure of the clean container of the present invention can reduce the number of fastening components, can be directly positioned on the cover body, and forms self-locking after fastening the seat body, and strengthens the elastic component.

Description

technical field [0001] The invention relates to a fastening structure of a container, in particular to a self-locking fastening structure applied to a clean container in a clean room. Background technique [0002] For general clean containers, no matter it is a photomask storage box, a wafer storage box or a glass substrate storage box, etc., the interior usually contains a photomask, a wafer or a glass substrate, which is suitable for use in semiconductor manufacturing processes. Covers, chips or glass substrates have extremely high requirements for ultra-clean storage environments to strictly prevent them from being polluted by fine dust particles, as well as being affected by static electricity or electrostatic fields. Today's semiconductor process requirements must reach Class 1 or above. Therefore, photomasks, wafers or glass substrates must be processed in an ultra-high clean and dust-free environment in general semiconductor manufacturing plants or flat-panel display ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B65D45/02B65D43/02H01L21/673
Inventor 吴宗明
Owner IND TECH RES INST
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