A method for model based geometry decomposition for use in a multiple exposure process and corresponding product

Abstract

A method of decomposing a target pattern having features to be imaged on a substrate so as to allow said features to be imaged in a multi-exposure process. The method includes the steps of: (a) segmenting a plurality of the features into a plurality of polygons; (b) determining the image log slope (ILS) value for each of the plurality of polygons; (c) determining the polygon having the minimum ILS value, and defining a mask containing the polygon; (d) convolving the mask defmed in step (c) with an eigen function of a transmission cross coefficient so as to generate an interference map, where the transmission cross coefficient defines the illumination system to be utilized to image the target pattern; and (e) assigning a phase to the polygon based on the value of the interference map at a location corresponding to the polygon, where the phase defines which exposure in said multi-exposure process the polygon is assigned.

Description

technical field [0001] The technical field of the invention relates generally to a method, program product, and apparatus for performing model-based decomposition on a target pattern to allow the target pattern to be imaged, eg, with multiple masks in multiple illumination passes. Background technique [0002] This application claims the benefit of U.S. Patent Application Serial No. 60 / 754,312, filed December 29, 2005, and U.S. Patent Application Serial No. 60 / 776,199, filed February 24, 2006, Both patent applications are hereby incorporated by reference in their entirety. [0003] A lithographic apparatus may, for example, be used in the manufacture of integrated circuits (ICs). In this case, the mask may contain a circuit pattern corresponding to the individual layers of the IC, and this pattern may be imaged onto a substrate (silicon wafer) that has been coated with a layer of radiation-sensitive material (resist) ( For example, on a target portion comprising one or mor...

AI Technical Summary

Problems solved by technology

As a result, for some target patterns, it is not possible to obtain k 1 <0.25

[0012] Another problem associated with current decomposition algorithms is that these algorithms are primarily rule-based algorithms that require a large number of rules to handle today's increasingly complex designs

Also, within a design for which no rules have been defined, multiple situations / conflicts often exist and these situations can cause the algorithm to fail to find a suitable result

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