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Alignment information display method, program thereof, alignment method, exposure method, device manufacturing method, display system, display device, program, and measurement/inspection device

一种信息显示、显示系统的技术，应用在对准信息显示及其程序、对准、曝光、组件制造、显示系统、显示装置、程序及测定/检查装置领域，能够解决难对准条件最佳化、难以决定有效条件及参数、困难数据的分析、评价等问题，达到有效对准条件和参数的设定的效果

Active Publication Date: 2007-07-25
NIKON CORP
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0019] However, it is conventionally known that information display of such alignment-related measurement results can only display data such as alignment measurement values, alignment correction values, residual components after alignment correction, and alignment mark waveforms on each wafer. Either the irradiated area is displayed with numerical data, or at most it can only be displayed with vector data for low-level display output
[0020] Therefore, based on the measurement results, the operator may have difficulty in determining the effective conditions and parameters for the alignment
That is, it is difficult to analyze and evaluate the data based on the data of the measurement results displayed and output, and it is difficult to optimize the alignment conditions and parameters

Method used

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  • Alignment information display method, program thereof, alignment method, exposure method, device manufacturing method, display system, display device, program, and measurement/inspection device
  • Alignment information display method, program thereof, alignment method, exposure method, device manufacturing method, display system, display device, program, and measurement/inspection device
  • Alignment information display method, program thereof, alignment method, exposure method, device manufacturing method, display system, display device, program, and measurement/inspection device

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Embodiment Construction

[0115] Embodiments of the present invention will be described with reference to FIGS. 1 to 23 .

[0116] In this embodiment, the present invention will be described by taking an exposure system having an exposure device and an alignment data evaluation system as an example.

[0117] exposure system

[0118] First, the overall configuration of the exposure system of this embodiment will be described with reference to FIGS. 1 to 3 .

[0119] FIG. 1 is a diagram showing the overall configuration of an exposure system 100 of this embodiment.

[0120] As shown in FIG. 1 , the exposure system 100 has N exposure devices 200 - 1 to 200 - n , an overlay measurement device 130 , and a host computer 140 . These devices can be connected via the LAN 110 so that data can be transferred to each other. In addition, other processing devices, measuring devices, computers, etc. can be further connected to LAN 110 for data transfer.

[0121] The exposure device 200-i (i=1˜n) (hereinafter ref...

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Abstract

The present invention relates to alignment information display method, program thereof, alignment methodm, exposure method, device manufacture methodm display system, display device, program, and measurement / inspection device capable of effectively performing analysis and evaluation of alignment results, which in turn enables easy setting of effective alignment condition and parameter. In the alignment information display method, data on processing results relating to the alignment measurement is inputted. When information on an alignment measurement parameter is inputted, according to the inputted parameter, information to be displayed is obtained from the data on the processing results and the obtained and desired information to be displayed is displayed in a display format in which the affect for alignment measurement is explicitly expressed. Accordingly, by setting a desired condition, it is possible to easily confirm the analysis result by the set condition, i.e., the affect by the set condition. Consequently, a user can easily detect an optimal alignment condition and a parameter.

Description

technical field [0001] The present invention relates to the alignment process carried out in the photolithography step when manufacturing electronic components such as semiconductor components, liquid crystal display components, CCD and other photographic components, plasma display components, and thin-film magnetic heads (hereinafter referred to as electronic components). Alignment information display method and alignment information display program that easily and appropriately set alignment measurement conditions, parameters, etc., and display information related to alignment processing in a desired format. In addition, it relates to an alignment method for determining the position of a wafer using conditions and parameters set based on displayed information, an exposure method for exposing by performing alignment by the alignment method, a component manufacturing method using the exposure method, and A display system that displays desired process-related information in a d...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/027G05B19/418G03F9/00G06Q50/00H01L21/00B23Q41/08G05B15/00
CPCG03F9/7092G03F9/7003G03F9/7046H01L21/682G03F7/70633Y02P90/80G05B15/00
Inventor 冲田晋一
Owner NIKON CORP
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