Winding plasma cvd apparatus

Abstract

A winding plasma CVD apparatus in which the film quality can be made homogeneous by supplying a reaction gas uniformly to a film deposition region and self-cleaning of a film deposition portion can be carried out during film deposition. A film (22) is supported between a pair of movable rollers (33, 34) arranged on the upstream side and downstream side of the film deposition portion (25) with regard to the moving direction of the film, and then the film (22) is moved substantially linearly at the film deposition position. Consequently, the distance between a shower plate (37) and the film (22) is kept constant, and the film quality is made homogeneous. The film (22) is heated by means of a metal belt (40) moving simultaneously on the back of the film. The movable rollers (33, 34) can ascend from the film deposition position to the self-cleaning position, and the film (22) can be separated from the shower plate (37). Self-cleaning can be carried out during film deposition by closing the opening of a mask (51) with a shutter (65) and thereby preventing leakage of cleaning gas.

Description

technical field [0001] The present invention relates to a roll-to-roll plasma CVD apparatus for forming a film on a thin film by plasma CVD while moving the thin film in a reduced-pressure environment. Background technique [0002] Conventionally, a roll-to-roll vacuum film-forming apparatus has been used, for example, to continuously form a long film or a film-like substrate (see Patent Documents 1 and 2 below). In this apparatus, a film is formed at a film formation position by plasma CVD or the like while moving the film fed from the unwinding unit at a constant speed, and then wound up by the take-up unit. [0003] Figure 7 The structure of the conventional roll-to-roll plasma CVD apparatus is shown. In the conventional roll-to-roll plasma CVD apparatus, the film 3 is unwound from the unwinding roll 2 inside the vacuum chamber 1, passed through a plurality of auxiliary rolls 4, wound onto a cylindrical roll 5 with a built-in heat source, and then passed through Severa...

AI Technical Summary

Problems solved by technology

[0011] However, in the above-mentioned conventional roll-to-roll plasma CVD apparatus, the film 3 wound on the cylindrical roll 5 always faces the high-frequency electrode 8, and when self-cleaning is performed, the film or surrounding parts are contaminated, so , has the problem that the self-cleaning of the film-forming part cannot be performed during the film-forming process of the thin film

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