Projection aligner including correction filters

A projection alignment and filter technology, applied in instruments, semiconductor/solid-state device manufacturing, optics, etc., can solve the problems of long turnover cycle, high cost, and long time of LCD devices

Inactive Publication Date: 2008-03-19
NEC LCD TECH CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This can be time consuming and costly in the process for manufacturing the correction filter, resulting in a longer turnaround and higher cost for the product LCD device

Method used

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  • Projection aligner including correction filters
  • Projection aligner including correction filters
  • Projection aligner including correction filters

Examples

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Embodiment Construction

[0028] Now, exemplary embodiments according to the present invention will be described with reference to the accompanying drawings.

[0029] FIG. 1 shows a side view of a projection aligner according to an exemplary embodiment of the present invention. This projection aligner, generally indicated by numeral 10, is used in a photolithography process for manufacturing an illuminance irregularity correction filter, and in a photolithography process for manufacturing an LC panel or a semiconductor device by using the thus-manufactured correction filter .

[0030] The projection aligner 10 includes an illumination optical system 11 that irradiates exposure light onto a photomask 14 and a projection optical system 12 that projects the exposure light that has passed through the photomask 14 onto the exposure light. On stage 31. The illumination optical system 11 includes therein a correction optical system 13 that corrects exposure light of the illumination optical system 11 . A p...

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Abstract

A projection aligner includes an illumination optical system which irradiates a mask pattern with an exposure light, an exposure optical system which irradiates a substrate on a stage with the exposure light passed by the illumination optical system, and a correction optical system including two correction filters for correcting the illuminance irregularity of the exposure light. The correction filters have a light transmission irregularity which is opposite to the illuminance irregularity of the projection aligner. The two correction filters are shifted from each other so that the transmittance distributions of both the correction filters are shifted from one another.

Description

[0001] This application is based on and claims the benefit of priority from Japanese Patent Application No. 2006-251478, the disclosure of which is incorporated herein by reference in its entirety. technical field [0002] The present invention relates to a projection aligner for projecting a mask pattern on a substrate arranged on an exposure stage by using exposure light. The invention also relates to a method for manufacturing a correction filter for correcting illumination irregularities of a projection aligner. Background technique [0003] Projection aligners are used in the process of manufacturing liquid crystal (LC) panels or semiconductor devices. The projection aligner usually includes an illumination optical system and a projection optical system. The illumination optical system irradiates the exposure light emitted by the light source on the photomask, which has a light-transmitting pattern on it. The projection optical system will pass through the Exposure lig...

Claims

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Application Information

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Patent Type & AuthorityApplications(China)
IPC IPC(8): G03F7/20H01L21/027
CPCG03B27/72
Inventor作道典博
OwnerNEC LCD TECH CORP