Memory structure and operating method thereof
一种操作方法、存储器的技术,应用在静态存储器、只读存储器、信息存储等方向,能够解决存储器操作方式或设计复杂度提高等问题
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0022] Please refer to FIG. 1 , which shows a schematic diagram of a memory structure according to a preferred embodiment of the present invention. The memory structure 100 includes a substrate 110 , a bottom oxide layer 120 , a charge trapping layer 130 , a top oxide layer 140 and a gate 150 . The substrate 110 includes a channel 112 , a source terminal 114 and a drain terminal 116 , and the source terminal 114 and the drain terminal 116 are respectively located on two sides of the channel 112 . The bottom oxide layer 120 is disposed on the channel 112 , and the thickness of the bottom oxide layer 120 is between 30 angstrom (A)˜40 Å. The charge trapping layer 130 is disposed on the bottom oxide layer 120 , the top oxide layer 140 is disposed on the charge trapping layer 130 , and the gate 150 is disposed on the top oxide layer 140 . Wherein the charge trapping layer 130 has a thickness ranging from 70 Ȧ to 200 Ȧ, and its material can be silicon nitride or aluminum oxide, and...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More - R&D
- Intellectual Property
- Life Sciences
- Materials
- Tech Scout
- Unparalleled Data Quality
- Higher Quality Content
- 60% Fewer Hallucinations
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com
