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Memory structure and operating method thereof

一种操作方法、存储器的技术,应用在静态存储器、只读存储器、信息存储等方向,能够解决存储器操作方式或设计复杂度提高等问题

Inactive Publication Date: 2008-06-18
MACRONIX INT CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] However, this kind of memory operation method must allow the memory to have the ability to apply two different operating voltages to the gate, which makes the operation method or design complexity of the memory relatively increased.

Method used

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  • Memory structure and operating method thereof
  • Memory structure and operating method thereof
  • Memory structure and operating method thereof

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Embodiment Construction

[0022] Please refer to FIG. 1 , which shows a schematic diagram of a memory structure according to a preferred embodiment of the present invention. The memory structure 100 includes a substrate 110 , a bottom oxide layer 120 , a charge trapping layer 130 , a top oxide layer 140 and a gate 150 . The substrate 110 includes a channel 112 , a source terminal 114 and a drain terminal 116 , and the source terminal 114 and the drain terminal 116 are respectively located on two sides of the channel 112 . The bottom oxide layer 120 is disposed on the channel 112 , and the thickness of the bottom oxide layer 120 is between 30 angstrom (A)˜40 Å. The charge trapping layer 130 is disposed on the bottom oxide layer 120 , the top oxide layer 140 is disposed on the charge trapping layer 130 , and the gate 150 is disposed on the top oxide layer 140 . Wherein the charge trapping layer 130 has a thickness ranging from 70 Ȧ to 200 Ȧ, and its material can be silicon nitride or aluminum oxide, and...

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PUM

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Abstract

A method for operating a memory, which is used to make the memory have a first threshold voltage or a second threshold voltage. The method includes: applying an operating voltage to the gate of the memory, and the operating voltage lasts for a first period of time, so that the memory has the first threshold voltage; and, applying the same operating voltage to the gate of the memory, the operating voltage lasts for a second period, so that the memory has a second threshold voltage. The length of the first time period is different from the length of the second time period.

Description

technical field [0001] The present invention relates to a memory structure and its operating method, and more particularly to a method of operating a memory with a single voltage and a memory structure using the same. Background technique [0002] The operation mode of the traditional memory is to apply an operating voltage to the gate of the memory, inject holes or electrons into the charge trapping layer of the memory to change the threshold voltage, and make the memory have a programming status. When reading with a read voltage, a bit state can be obtained, such as 0 or 1; when data is to be erased, another operating voltage is applied to the gate of the memory, and the holes or electrons are removed from the charge of the memory. The trapping layer excludes, or extracts complementary charge carriers from the underlying substrate to neutralize the trapped electrons or holes to restore the threshold voltage to an erased state, which can be obtained when reading using the r...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G11C16/06H01L27/115H10B69/00
CPCG11C16/10
Inventor 吴昭谊薛铭祥
Owner MACRONIX INT CO LTD
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