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Optical approximation correction model calibration method based on photoresist inclined slope width weighting

A technology of optical approximation correction and calibration method, which is applied in the photo-engraving process of originals, optics, and pattern surfaces for opto-mechanical processing, and can solve the problems of distinction and lack of distinction reliability.

Inactive Publication Date: 2008-07-09
GRACE SEMICON MFG CORP
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Problems solved by technology

By using such a weighted method, one-dimensional graphics with higher credibility can be successfully distinguished from two-dimensional graphics with lower credibility; however, for the same one-dimensional graphics, or the same two-dimensional graphics, there is no What is the difference in credibility between them, and in fact, there is also a difference in credibility between the same-dimensional graphics

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  • Optical approximation correction model calibration method based on photoresist inclined slope width weighting
  • Optical approximation correction model calibration method based on photoresist inclined slope width weighting
  • Optical approximation correction model calibration method based on photoresist inclined slope width weighting

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Embodiment approach

[0066] As shown in Fig. 2, the present invention provides a kind of optical approximation correction model calibration method based on photoresist slope width weighting, and it comprises the following steps:

[0067] Step 1. Select a number of measurement points to sample the entire optical system and photolithography process: collect the key dimension values ​​of each measurement point, and the corresponding photoresist slope width value of each measurement point;

[0068] Step 2. Apply the photoresist slope width corresponding to each measurement point to the weighting process to calibrate the optical model; specifically:

[0069] Use one-dimensional graphics to measure points, by adjusting various parameters describing the optical system, including numerical aperture, numerical aperture edge transition width, coherence coefficient, depth of field, etc., let the optical model predict the simulated key dimension value of the measured point and The actual critical dimension va...

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Abstract

A method for calibrating an optical approximate correction model based on photoresist slope-width weighting is characterized in that: when key dimension values of each measurement point are collected, photoresist slope-width values corresponding to each measurement point are collected; the method can be applied in weighting steps of the process of calibrating the optical approximate correction model. By taking the photoresist slope width as a weighting instructive mark, the method provided by the invention not only can distinguish between a single-dimensional graph and a two-dimensional graph with different confidence levels, but also can distinguish measuring points with different confidence levels in graphs with the same dimension; in addition, the optimized optical approximate correction model calibrated by the method is more accurate and stable.

Description

technical field [0001] The invention relates to a method for calibrating an optical approximation correction model, in particular to a method for calibrating an optical approximation correction model based on the weighting of the slope width of photoresist. Background technique [0002] For the calibration of the optical approximation correction model, the quality of the measurement point data used to establish the optical approximation correction model determines whether the model is accurate. It includes two considerations. First, the parameter space of the model is required to be fully sampled. On the other hand, the data accuracy. The assumptions are that the measured data are correct and the parameter space of the model is sufficiently sampled. Although there are advanced measurement tools, there are still great uncertainties in the measurement of one-dimensional micro-critical dimensions and two-dimensional graphics. The weighting method in the traditional optical ap...

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Application Information

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IPC IPC(8): G03F1/14G03F1/36
Inventor 朱亮
Owner GRACE SEMICON MFG CORP
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