Radiation curable developing polyurethane and radiation curable developing light resistance composition

A radiation curing, polyurethane technology, applied in the field of photoresist composition, can solve the problem of high temperature processing and other problems

Inactive Publication Date: 2008-10-15
AGI INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In Japanese Patent Application Publication No. 11-271736, etc., there are studies on the use of plastic substrates, but generally speaking, the plastic substrates have the problem that they cannot be processed at high temperatures; and in Japanese Patent Application Publication No. 2000-214468 , there is mention of the possibility of low-temperature hardening using plastic substrates

Method used

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  • Radiation curable developing polyurethane and radiation curable developing light resistance composition
  • Radiation curable developing polyurethane and radiation curable developing light resistance composition
  • Radiation curable developing polyurethane and radiation curable developing light resistance composition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0049] Place 31.9 grams of MDI (m-phenylene diisocyanate) and 80 grams of PMA (propylene glycol monomethyl ether acetate) in a 500-mL four-neck separable reaction flask, raise the temperature to 60°C and stir it mechanically Stir with the mixer until the MDI is completely dissolved. Subsequently, 16.2 grams of DMPA (di(hydroxymethyl)propionic acid) and 13.6 grams of PPG-1000 (poly(propylene glycol)-1000) that had been completely mixed in 50 grams of NMP (N-methylpyrrolidone) were added dropwise. Molecular weight is 1000), and after the drop is finished, use FTIR (Fourier Transform Infrared Spectrometer) to judge whether the NCO (isocyanate functional group) has completely reacted. After the reaction is complete, finally raise the temperature to 100° C. and add 8.3 g of GMA (glycidyl methacrylate), and maintain the temperature until the acid value of the solution reaches about 18 mgKOH / g, then the synthesis is completed. The polyurethane 1 with radiation curable development of...

Embodiment 2

[0052] 31.9 g of MDI and 80 g of PMA were placed in a 500 mL four-neck separable reaction flask, the temperature was raised to 60° C. and stirred with a mechanical stirrer until the MDI was completely dissolved. Subsequently, start to drop 16.2 grams of DMPA and 13.6 grams of CAPA that have been completely mixed in 50 grams of NMP beforehand. 2101A (polycaprolactone diol) (molecular weight: 1000), and use FTIR to judge whether the NCO is completely reacted after the drop is completed. After the reaction is complete, finally raise the temperature to 100° C. and add 8.3 g of GMA, and maintain the temperature until the acid value of the solution reaches about 18 mgKOH / g, then the synthesis is completed. The radiation-curable and developable polyurethane 2 of the present invention is obtained, and the Mw measured by GPC (gel permeation chromatography) is 15,000-35,000.

Embodiment 3

[0054] 31.9 g of MDI and 80 g of PMA were placed in a 500 mL four-neck separable reaction flask, the temperature was raised to 60° C. and stirred with a mechanical stirrer until the MDI was completely dissolved. Subsequently, 16.2 g of DMPA and 13.6 g of PC-diol (molecular weight: 1000) which had been completely mixed with 50 g of NMP were added dropwise, and after the drop was completed, FTIR was used to determine whether the NCO had completely reacted. After the reaction is complete, finally raise the temperature to 100° C. and add 8.3 g of GMA, and maintain the temperature until the acid value of the solution reaches about 18 mgKOH / g, then the synthesis is completed. The radiation-curable and developable polyurethane 3 of the present invention is obtained, and the Mw measured by GPC (gel permeation chromatography) is 15,000-35,000.

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Abstract

The invention discloses a polyurethane which can be radiated, solidified and developed, and optical resistance composition which comprises the polyurethane and can be radiated, solidified and developed; the polyurethane consists of a main chain carboxylic group, a side chain acryloyl and repeated units (I), (II) and (III) as follows, which are arranged irregularly: R is C<1-12> direct chain or branched alkylidene, C<3-8> ring-shaped alkylidene, phenylene, biphenylene, naphthylene moiety, xylylene, xylidine, -Ph-A-Ph- group (wherein, A is CH2, -NH- or -O-); R' is dimethyl group; the repeated units (I), (II) and (III) can be provided with one or more OH substituents; furthermore R'' is C<1-6> alkyl of direct chain or branch chain provided with one or more OH substituents; the weight average molecular weight of the polyurethane measured by gel permeation chromatography is ranged from 3000 to 400,000 and the acid value thereof is ranged from 5 to 120 mgKOH / g.

Description

Technical field: [0001] The invention relates to a radiation-curable and developable polyurethane and a radiation-curable and developable photoresist composition containing the polyurethane. Background technique: [0002] The color filter of a thin film transistor liquid crystal display (TFT LCD) is one of the important components in a general liquid crystal display. It can be used for colorizing the image displayed on the liquid crystal display device. Its main function is to convert the white backlight into red (R ), green (G), blue (B) and other three primary colors, to form the purpose of full-color display. [0003] At present, the pattern layer of the color filter is mostly made by spin coating, and the photoresist is evenly coated on the substrate, and the solvent is removed by pre-baking, and then hardened by the photomask. The process of selective exposure of the area, followed by alkaline development and heating to harden, repeats this process three times, and the...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/027G03F7/004
Inventor 黄伟翔陈膺仁张瑞铭郭俊宏林弘晓张立中
Owner AGI INC
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