Method for recovering tail-gas generated during producing polycrystalline silicon using silicon tetrachloride
A technology of silicon tetrachloride and polysilicon, applied in the direction of silicon halide compounds, silicon, halosilane, etc., can solve the problems of insufficient utilization, large material consumption, serious environmental pollution, etc., and reduce the generation of pollutants and quantity, reducing the generation of pollutants, and the effect of solving environmental pollution problems
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[0025] refer to figure 1 , which shows a flow chart of the industrial production of polysilicon that can be applied to the method for recovering the tail gas produced by the production of polysilicon by using silicon tetrachloride according to an embodiment of the present invention. In the prior art, there are multiple methods that can be industrialized The production of polysilicon, application polysilicon production technique of the present invention is to utilize industrial silicon and hydrogen chloride (HCl) as main raw material, generates trichlorosilane (SiHCl) by controlling reaction conditions 3 )-based mixture of chlorosilane and hydrogen, and then trichlorosilane (SiHCl 3 ) after being purified, sent to the reduction furnace to make trichlorosilane (SiHCl 3 ) and auxiliary material hydrogen (H 2 ) reaction, reduction to generate polysilicon.
[0026] In the process of the above-mentioned industrial production of polysilicon, the tail gas produced mainly includes h...
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