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Method for recovering hydrogen from tail gas produced in polysilicon production

A polysilicon and hydrogen technology, applied in separation methods, chemical instruments and methods, hydrogen separation, etc., can solve the problems of insufficient utilization, large material consumption, environmental pollution, etc., to reduce the generation and quantity of pollutants, The effect of reducing consumption and solving environmental pollution problems

Active Publication Date: 2011-11-30
CHINA ENFI ENGINEERING CORPORATION
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The outstanding feature of the traditional polysilicon production process is the tail gas wet recovery technology, that is, the tail gas in the reduction furnace is initially pressurized to separate chlorosilane and then washed with water to recover hydrogen. Due to the process of water washing, impurity gases such as oxygen and carbon dioxide in the water will be released. Contamination of hydrogen, so a large amount of recovered hydrogen needs to be purified again. During the leaching process, chlorosilane is hydrolyzed to produce sewage, which needs further treatment, resulting in environmental pollution and large material consumption.
At the same time, the hydrogen generated in the production has not been fully utilized, which not only wastes energy, but also causes environmental pollution

Method used

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  • Method for recovering hydrogen from tail gas produced in polysilicon production
  • Method for recovering hydrogen from tail gas produced in polysilicon production
  • Method for recovering hydrogen from tail gas produced in polysilicon production

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Embodiment 1

[0021] refer to figure 1 , which shows a flow chart of the industrial production of polysilicon that can be applied to the hydrogen recovery method according to the embodiment of the present invention. In the prior art, there are multiple methods for industrial polysilicon production. The application of the polysilicon production process of the present invention is Using industrial silicon and hydrogen chloride (HCl) as the main raw materials, trichlorosilane (SiHCl) is produced by controlling the reaction conditions. 3 )-based mixture of chlorosilane and hydrogen, and then trichlorosilane (SiHCl 3 ) after being purified, sent to the reduction furnace to make trichlorosilane (SiHCl 3 ) and auxiliary material hydrogen (H 2 ) reaction, reduction to generate polysilicon.

[0022] In the process of the above-mentioned industrial production of polysilicon, the tail gas produced mainly includes hydrogen (H 2 ), hydrogen chloride (HCl), and chlorosilanes, which mainly include dic...

Embodiment 2

[0035] Refer below image 3 A method for recovering hydrogen from tail gas produced in the production of polysilicon according to a second embodiment of the present invention will be described. image 3 Shown is the flow chart according to the second embodiment of the present invention, and the main difference between this embodiment and the above-mentioned first embodiment is that it also includes hydrogen chloride (HCl) and silicon tetrachloride (SiCl) adsorbed in the activated carbon. 4 ) recovery process.

[0036] Specifically, hydrogen chloride (HCl) and chlorosilane (here, the main component of the chlorosilane is silicon tetrachloride (SiCl) adsorbed in the activated carbon 4 )) is heated to a temperature of about 80-180°C, thereby improving the movement activity of gas molecules, and then using, for example, high-purity hydrogen (H 2 ) will be heated gaseous hydrogen chloride (HCl) and chlorosilane (here, the main component of the chlorosilane is silicon tetrachlorid...

Embodiment 3

[0038] Refer below Figure 4 A method for recovering hydrogen from tail gas produced in the production of polysilicon according to a third embodiment of the present invention will be described. refer to Figure 4 , The main difference between the third embodiment of the present invention and the above-mentioned first and second embodiments is: it also includes the use of liquid silicon tetrachloride (SiCl 4 ) a step of rinsing the tail gas.

[0039] In the traditional wet tail gas treatment process, the tail gas is usually rinsed with water. The purpose is to wash the hydrogen chloride (HCl) in the tail gas into the water, and part of the unrecovered chlorosilane is hydrolyzed into Hydrogen chloride and silicon dioxide hydrate, such sewage needs to be treated separately, resulting in large material consumption and serious environmental pollution, which limits large-scale industrial production.

[0040] According to an embodiment of the present invention, the washing process...

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Abstract

A method for recovering hydrogen from tail gas produced by polysilicon production, said tail gas mainly comprising hydrogen, hydrogen chloride, dichlorodihydrosilane, trichlorosilane and silicon tetrachloride, said method comprising the steps of: pressurizing and Cool the tail gas so that trichlorosilane and silicon tetrachloride become liquid, while hydrogen, hydrogen chloride, and dichlorodihydrosilane are still gaseous, so that gaseous hydrogen, hydrogen chloride, and dichlorodihydrosilane are separated by gas-liquid separation Hydrogen silicon is separated from liquid trichlorosilane and silicon tetrachloride; gaseous hydrogen, hydrogen chloride, and dichlorodihydrosilane are passed through liquid silicon tetrachloride so that gaseous hydrogen chloride and dichlorodihydrosilane are dissolved in Liquid silicon tetrachloride, thereby separating hydrogen from hydrogen chloride and dichlorodihydrosilane. The invention adopts dry treatment to recover the hydrogen in the tail gas, and can reuse it in polysilicon production, fully utilizes the raw material, reduces pollutants, solves the problem of environmental pollution, improves product quality and reduces cost.

Description

technical field [0001] The invention relates to a method for recovering and treating tail gas produced by industrial production of polysilicon, more specifically, to a method for recovering hydrogen from the tail gas produced by producing polysilicon. Background technique [0002] Polycrystalline silicon is the raw material for preparing monocrystalline silicon, which is ultimately used in the production of integrated circuits and electronic devices. It is one of the basic raw materials with the largest consumption and the highest purity requirements in the information industry. It is also a product and industry that the country encourages the development of. [0003] The world's advanced polysilicon production technology has always been monopolized by companies from the United States, Japan, and Germany. Each company has its own technical secrets and technical characteristics. After continuous research and development, it has formed its own production process. Set out, stri...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B3/50C01B3/52B01D53/04B01D53/14B01D53/00
Inventor 沈祖祥严大洲汤传斌肖荣晖毋克力
Owner CHINA ENFI ENGINEERING CORPORATION
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