Clamping device of sputtering substrate
A technology for holding devices and substrates, applied in sputtering plating, ion implantation plating, vacuum evaporation plating, etc., can solve problems affecting the overall sputtering effect of the substrate 10, and achieve the best sputtering effect
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[0015] The embodiments of the present invention will be further described in detail below in conjunction with the accompanying drawings.
[0016] Please refer to FIG. 2 , a sputtering substrate holding device 20 provided in the first embodiment of the present invention is used to hold a substrate 200 during the sputtering process. The substrate 200 has a sputtering surface 200a and a side 200b adjacent to the sputtering surface 200a. The sputtering substrate holding device 20 includes a substrate 21 , a plurality of holding units 22 and a plurality of holding units 23 .
[0017] The substrate 21 is used to carry the base material 200, and its upper surface 21a is provided with a plurality of reference holes, such as threaded through holes 210. Preferably, the base material 200 can be a cylindrical structure, and its side 200b is the The outer peripheral surface of a cylindrical structure. Certainly, the substrate 200 may also be of other structures, such as a cuboid structur...
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