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Clamping device of sputtering substrate

A technology for holding devices and substrates, applied in sputtering plating, ion implantation plating, vacuum evaporation plating, etc., can solve problems affecting the overall sputtering effect of the substrate 10, and achieve the best sputtering effect

Inactive Publication Date: 2011-05-04
HONG FU JIN PRECISION IND (SHENZHEN) CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when using the collar 12 to fix the substrate 10, since the collar 12 exerts a pressure from the sputtering surface 10a of the substrate 10, the sputtering surface 10a of the substrate 10 will Inevitably contradict each other, which will cause the sputtering surface 10a of the substrate 10 to be sputtered due to being covered by the collar 12 when the sputtering surface 10a of the substrate 10 is being coated, thereby affecting the substrate 10. The overall sputtering effect of

Method used

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  • Clamping device of sputtering substrate
  • Clamping device of sputtering substrate
  • Clamping device of sputtering substrate

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Embodiment Construction

[0015] The embodiments of the present invention will be further described in detail below in conjunction with the accompanying drawings.

[0016] Please refer to FIG. 2 , a sputtering substrate holding device 20 provided in the first embodiment of the present invention is used to hold a substrate 200 during the sputtering process. The substrate 200 has a sputtering surface 200a and a side 200b adjacent to the sputtering surface 200a. The sputtering substrate holding device 20 includes a substrate 21 , a plurality of holding units 22 and a plurality of holding units 23 .

[0017] The substrate 21 is used to carry the base material 200, and its upper surface 21a is provided with a plurality of reference holes, such as threaded through holes 210. Preferably, the base material 200 can be a cylindrical structure, and its side 200b is the The outer peripheral surface of a cylindrical structure. Certainly, the substrate 200 may also be of other structures, such as a cuboid structur...

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PUM

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Abstract

The invention relates to a sputtering substrate fixing device which is used to fix a substrate during sputtering, wherein the substrate is provided with a sputtering surface and a side surface adjacent to the sputtering surface, the sputtering substrate fixing device comprises: a base plate used to bear the substrate; a plurality of clamping units which surround the substrate and are distributed on the base plate to be propped against the substrate from the side surface of the substrate, the plurality of clamping units are a plurality of propping pieces including a base and an extension; and a plurality of fixing units which are connected with the base plate and the clamping units to fix the clamping units on the base plate. With the clamping units, the sputtering substrate fixing device fixes the substrate from the side surface of the substrate, so as to fix the substrate during sputtering, prevent the sputtering surface of the substrate from being covered during sputtering, so that the substrate has quite good sputtering effect.

Description

technical field [0001] The invention relates to a holding device, in particular to a holding device used for holding a base material in a sputtering process. Background technique [0002] Sputtering is the use of ions generated by plasma to hit the cathode target, and the atoms in the target are knocked out and deposited on the surface of the substrate to form a coating. Because sputtering can simultaneously achieve better deposition efficiency, precise composition control, and lower manufacturing cost, it is widely used in industry. The research of sputtering can refer to the paper Reduction of Plasma-Induced Gate Oxide Damage Using Low- Energy Large-Mass Ion Bombardment in Gate-Metal Sputtering Deposition. [0003] As shown in FIG. 1 , when sputtering a substrate 10 , it is generally necessary to use a holding device 1 to hold the substrate 10 . The existing holding device 1 usually includes a collar 12 and a plurality of bolts 13, by setting a plurality of screw holes ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/50C23C14/34
Inventor 骆世平
Owner HONG FU JIN PRECISION IND (SHENZHEN) CO LTD