Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Sputtering device for large-area glass magnetron sputtering coating production line

A magnetron sputtering coating and production line technology, applied in sputtering coating, ion implantation coating, vacuum evaporation coating and other directions, can solve the problem of single structure, poor coating stability, and unsuitable sputtering machine for large-area glass coating and other problems, to achieve a good effect of sputtering

Inactive Publication Date: 2019-06-21
XIANGTAN HONGDA VACUUM TECH CO LTD
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, due to the single internal structure of ordinary sputtering machines, it usually takes a long time to reach the coating thickness required by the product; at the same time, because of its low vacuum degree, it is difficult for the product to maintain a high vacuum state during the sputtering coating process, and the coating stability is poor. , the coating purity is low
In addition, existing sputtering machines are not suitable for large-area glass coating

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Sputtering device for large-area glass magnetron sputtering coating production line
  • Sputtering device for large-area glass magnetron sputtering coating production line
  • Sputtering device for large-area glass magnetron sputtering coating production line

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0024] Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings. It should be understood that the specific embodiments described here are only used to illustrate and explain the present invention, and are not intended to limit the present invention.

[0025] figure 1 and figure 2 An embodiment of the sputtering device used in the large-area glass magnetron sputtering coating production line of the present invention is shown. The sputtering device is arranged in a vacuum sputtering chamber. The sputtering device includes a turntable 1, a mounting frame 3 and three The sputtering gun 2, the turntable 1 is installed in the sputtering chamber through the mounting frame 3, the turntable 1 is provided with at least three target positions 11, the sputter gun 2 is driven through or away from the corresponding target positions 11 by the first driving device, the turntable 1 The second driving device is used to driv...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a sputtering device for a large-area glass magnetron sputtering coating production line. The sputtering device comprises a carrier, fixing frames, an installation frame and a plurality of conveyor belts, wherein each cavity of the production line is provided with one conveyor belt, the fixing frames are fixedly installed on the conveyor belts, the four fixing frames are arranged in pairs, every two fixing frames are spaced, the carrier is fixed on the installation frame, and the installation frame is clamped between the two pairs of fixing frames. The sputtering devicefor the large-area glass magnetron sputtering coating production line can stably convey large-area glass substrates, and is suitable for large-area glass substrates of various sizes.

Description

technical field [0001] The invention relates to the technical field of glass coating, in particular to a sputtering device used in a large-area glass magnetron sputtering coating production line. Background technique [0002] The transparent conductive films currently on the market mainly include ITO (In 2 o 3 :Sn), FTO (SnO 2 : F), AZO (ZnO: Al) three. Each has its own advantages and disadvantages, such as ITO has relatively low resistivity and high cost; FTO has low cost, high film forming temperature, and poor stability in hydrogen plasma environment; AZO has good stability in hydrogen plasma environment, low cost, and electrical The performance is not as good as ITO. Thin-film solar cells with different absorbing layers need to select a suitable transparent conductive film to obtain the best interface effect. Aluminum-doped zinc oxide (AZO) thin film may become an important material for amorphous silicon / microcrystalline silicon thin film solar cells, Transparent c...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35
Inventor 祝海生黄乐陈立凌云黄夏孙桂红黄国兴
Owner XIANGTAN HONGDA VACUUM TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com