Polishing pad finishing head

A polishing pad, an integrated technology, applied in the direction of grinding/polishing equipment, abrasive surface adjustment devices, grinding machine parts, etc., can solve problems such as unstable air pressure, rubber bowl 1 fatigue damage, easy to break, etc., to achieve guaranteed repair effect, increase service life, improve the effect of dressing wheel

Inactive Publication Date: 2009-02-18
SEMICON MFG INT (SHANGHAI) CORP +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] 1. After the existing polishing pad dressing head is used for a period of time, the rubber bowl 1 is easily broken due to fatigue damage, aging, and the mandrel 3 cannot move up and down, so the dressing wheel 13 cannot dress the polishing pad;
[0007] 2. After the rubber bowl 1 is broken, the air bag leaks and the air pressure is unstable, which causes the pressure of the dressing wheel 13 on the polishing pad to be unstable, which affects the dressing effect of the dressing wheel 13 on the polishing pad

Method used

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Embodiment Construction

[0035] The present invention will be further described below in conjunction with specific embodiments and accompanying drawings.

[0036] Such as image 3 and Figure 4 As shown, the polishing pad dressing head of the first specific embodiment of the present invention includes a rotatable air pipe joint 7, a synchronous pulley 8, a second rotating block 14, a key 5, a support body 9, a bearing 10, a first cylinder Body 15, first cylinder piston 16, two rotating rings 6. Described synchronous pulley 8, the second rotating block 14, the first cylinder piston 16, and the rotating ring 6 are connected as one; 2 bearings 10 are installed on each rotating ring 6, therefore, the rotating ring 6 and the first cylinder piston 16 It can rotate under the drive of the synchronous pulley 8; the inside of the second rotating block (14) and the first cylinder piston (16) has a second air pipe passage (20); the key 5 is fixed on the core of the first cylinder body On the shaft 17, the inne...

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PUM

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Abstract

The invention discloses a finishing head of a polishing pad, which comprises a rotatable gas pipe connector (7), a synchronous pulley (8), a key (5), a supporting body (9), bearings (10) and a rotating ring (6), wherein the rotating ring (6) is provided with two bearings (10); and the finishing head also comprises a second turning block (14), a first cylinder body (15), a first cylinder piston (16) and a sealing ring (19). The finishing head of the polishing pad solves the problems of poor reliability and poor stability of the prior finishing head due to the damage of a rubber cup, improves the reliability and stability, and prolongs the service life of the finishing head.

Description

technical field [0001] The invention relates to the field of chemical mechanical polishing in the chip manufacturing process, in particular to a polishing pad conditioning head (Pad Conditioner Head). Background technique [0002] In a chemical mechanical polishing (CMP) machine, a dressing head is used to fix a dressing wheel (Disk) and drive the dressing wheel to dress a polishing pad (Pad). The small holes in the surface of the polishing pad are used to transport abrasive and improve polishing uniformity. Polishing pads are consumable parts. After polishing some chips, their surface will become flat and smooth, reaching a state called smooth surface. A polishing pad in this state cannot hold polishing abrasives, thereby significantly reducing the polishing rate. Therefore, regular dressing of the polishing pad is required to ensure consistent polishing performance. Driven by the dressing head, the dressing wheel presses on the surface of the polishing pad and rotates a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B24B53/12
Inventor 王怀锋张伟光党国锋赵铁军
Owner SEMICON MFG INT (SHANGHAI) CORP
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