Undulation inspecting device, undulation inspecting method, control program of undulation inspecting device, and recording medium

The technology of a detection device and detection method is applied in the fields of fluctuation detection device, fluctuation detection, control program of fluctuation detection device, and recording medium, which can solve the problems of not being able to detect the change of brightness and being difficult to detect the difference in film thickness, etc., and achieve structural Simple, achieve the effect of production yield

Inactive Publication Date: 2009-06-24
SHARP KK
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  • Summary
  • Abstract
  • Description
  • Claims
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Problems solved by technology

[0004] However, even when the film thickness difference between each pixel of the color filter is tens of nm, the transmittance between pixels may differ by less than 1%.
That is, even if the transmitted light is directly photographed, there is almost no change in luminance to be detected, so it is difficult to detect a film thickness difference of several tens of nm as a defect.

Method used

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  • Undulation inspecting device, undulation inspecting method, control program of undulation inspecting device, and recording medium
  • Undulation inspecting device, undulation inspecting method, control program of undulation inspecting device, and recording medium
  • Undulation inspecting device, undulation inspecting method, control program of undulation inspecting device, and recording medium

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Embodiment Construction

[0072] The waviness detection device of the present invention can use objects with fine waviness on the surface as detection objects.

[0073] Examples of detection objects include color filter substrates (particularly, substrates formed by an inkjet method), semiconductor wafers on which exposure resists are formed, TFT substrates, and the like. Hereinafter, an embodiment of the waviness detection device of the present invention will be described with a color filter substrate as a detection object.

[0074] figure 1 is a schematic diagram showing the main parts of the fluctuation detection device of the present invention, figure 2 is a block diagram showing the fluctuation detection device. Such as figure 1 and figure 2 As shown, the fluctuation detection device 1 includes: a substrate driving platform 5 , a line illumination 2 , an area sensor 3 , a line sensor 4 , an illumination driving platform 6 , a control device 8 , a storage unit 19 and a display monitor 9 . Th...

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Abstract

An undulation inspecting device is comprised of a light irradiating means (a line illumination (2)) for irradiating light to an object for inspection, a light intensity acquiring means (an area sensor (3)) for acquiring a light intensity distribution of light reflecting from a surface of the object to which the light is irradiated, an image pickup means (a line sensor (4)) for acquiring only prescribed light from the one reflecting from the surface of the object, an adjusting means (an image processing unit (20) and an illumination driving control unit (21)) for adjusting the light irradiating means (line illumination (2)) in accordance with the light intensity distribution acquired from the light intensity acquiring means, and a judging means (a defect judgment processing unit (23)) for judging an undulation state formed on the surface of the object in accordance with the image pickup result of the image pickup means after the adjusting. Thus, the undulation inspecting device that can easily and highly accurately inspect the undulation state (thickness difference) on the surface of the object such as a large size substrate (a color filter substrate and the like) can be provided.

Description

technical field [0001] The invention relates to a detection method for detecting the undulation state of an object with fine undulation (undulation) on its surface. Background technique [0002] In recent years, the demand for liquid crystal display devices such as liquid crystal televisions and liquid crystal monitors has been expanding, and at the same time, the demand for cost reduction has been increasing year by year. In particular, color filters account for a large proportion of the production costs of liquid crystal display devices, and therefore, it is required to reduce the production costs of color filters. [0003] When there is a film thickness difference of several tens of nanometers between the pixels of the color filter, there will be a difference in the transmittance and the cell gap between the pixels, and the color difference will occur when the color filter is panelized. Problems with defects such as uniform defects. Therefore, the color filter is inspec...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B11/06G01N21/88
CPCG01N2021/9513G01N21/8901G01N2021/556G01B11/306
Inventor 伊藤健二井殿多闻村上豪
Owner SHARP KK
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