Method for testing dynamic homogeneity of slot discharging plasmas
A discharge plasma and detection method technology, applied in the field of plasma detection, can solve the problems that cannot represent the discharge situation and cannot be used to detect dynamic uniformity
Inactive Publication Date: 2011-01-05
HEBEI UNIVERSITY
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Problems solved by technology
For AC gas discharge, the result obtained in this way is actually the effect of integration over a period of time, and cannot represent the discharge situation in each applied voltage cycle
Therefore, these methods cannot be used to detect dynamic uniformity
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The invention relates to a method for testing dynamic homogeneity of slot discharging plasmas, which is characterized by comprising the following steps: A. a slot discharging device generates discharging plasmas; B. after being imaged by lenses, the light emitted by the discharging plasmas is received by a receiving screen with a diaphragm of which the aperture is a; C. a photomultiplier is arranged at the back of the diaphragm so as to detect the light emitting signals of a plasma area; the light signals are converted to electric signals and then recorded by a digital oscilloscope; and D. according to the recorded light signals, the discharging times within a half period of a discharging voltage are calculated, the relationship between the discharging times of the light-emitting plasma area and the discharging area is analyzed, thereby determining whether the plasmas reach the dynamic homogeneity. The testing method is significant to the application of micro plasmas to the industry.
Description
A detection method for dynamic uniformity of slit discharge plasma technical field The invention relates to a detection method for the dynamic uniformity of slit discharge plasma, which belongs to the technical field of plasma detection. Background technique As we all know, gas discharge plasma technology has been widely used in many industrial fields. In many applications (such as material processing, thin film growth and etching), in order to achieve better material processing results, it is usually required that the plasma is uniform. However, in most cases, the plasma generated by the discharge is not uniform, and it is difficult to achieve uniform discharge especially under atmospheric pressure. Only in some special cases (such as fine-pitch slit discharge) can uniform discharge occur. At present, for the detection of discharge uniformity, the common method is to observe with naked eyes or take pictures with a camera. For AC gas discharge, the result obtained in thi...
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IPC IPC(8): G01R31/00G01J1/42G01N21/66
Inventor 董丽芳张彦召
Owner HEBEI UNIVERSITY