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Reverse osmosis terminal rinsing method for plating part

A reverse osmosis and terminal technology, applied in the direction of electrolysis components, cells, electrolysis process, etc., can solve the problems of waste of resources, water pollution, etc., and achieve the effect of saving water resources and realizing reuse

Inactive Publication Date: 2010-05-12
厦门启和电器有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] At present, the treatment technologies of various electroplating industries have a common problem, that is, after the electroplating sewage is produced, it is not effectively treated, resulting in water pollution and waste of resources.

Method used

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  • Reverse osmosis terminal rinsing method for plating part
  • Reverse osmosis terminal rinsing method for plating part
  • Reverse osmosis terminal rinsing method for plating part

Examples

Experimental program
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Embodiment Construction

[0019] The present invention will be further described below through embodiment.

[0020] The plated parts with plating solution are transferred from the electroplating tank to the 4-level rinse tank for cleaning. The concentration of the plating solution in the 4-level rinse tank follows the cleaning sequence of the plated parts from high to low. With the increase of electroplating hours, the concentration of each rinsing tank will increase, and the end point will be when the concentration of the final rinsing tank reaches the specified value (control point). The maximum metal concentration corresponding to the control point is 5-10mg / L. It is assumed that the period from the beginning to the end when the concentration of the rinsing tank reaches the control point is a cycle. At this time, the wastewater in the 4-stage rinsing tank is pumped to the storage tank by a pump, and then enters the treatment process of the reverse osmosis membrane device after passing through the pre...

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Abstract

The invention discloses a reverse osmosis terminal rinsing method for a plating part, relates to a cleaning technique for the plating part, and provides a reverse osmosis terminal rinsing method for the plating part, which can fully utilize water resource, reduce the discharge amount of waste water and recover useful resources. The rinsing method comprises the following steps: conveying the plating part attached with plating solution into a multi-stage rinsing tank for cleaning, using a pump to pump the waste water in the terminal rinsing tank to a storage tank when metal concentration of the terminal rinsing tank reaches to a specified value, entering a reverse osmosis film treatment device after passing through a pretreatment device, and obtaining the purified rinsing solution and electroplating solution material; and leading the purified rinsing solution to pass through the osmosis treatment device, then enter the terminal rinsing tank for supplying pure water, and enter next period of rinsing; while the electroplating solution material can be recovered and the electroplating tank can be recycled.

Description

technical field [0001] The invention relates to a cleaning process for plated parts, in particular to a reverse osmosis terminal rinsing method for plated parts. Background technique [0002] In the electroplating industry, the cleaning of plated parts is an important link in the electroplating process. After each seed plating process, the plated parts must be cleaned, the purpose of which is to remove the plating solution carried out from the plated parts, clean it up, and ensure the quality of the plated parts. At present, the vast majority of electroplating manufacturers set up several cleaning tanks after the electroplating tank for continuous parallel cleaning, which is called "long running water" cleaning. Table 1 shows the comparison of traditional cleaning methods. A large amount of waste water is discharged during the production process. The waste water is mixed with a variety of metals, such as chromium, zinc, copper, nickel, etc., and is directly discharged witho...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C25D21/08
Inventor 苏国强
Owner 厦门启和电器有限公司