Peripheral exposure device and method thereof
A technology of exposure device and exposure method, which is applied in the direction of photolithography exposure device, microlithography exposure equipment, optics, etc., and can solve the problems of inability to ensure linearity, non-parallel peripheral exposure areas, and inability to ensure boundaries, etc.
Inactive Publication Date: 2012-10-31
ORC MFG
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Problems solved by technology
Although the straightness of the first reference side and the second reference side can be ensured, the straightness of the sides facing these reference sides cannot be ensured.
Therefore, the existing peripheral exposure device also has the problem that the boundary cannot be ensured when performing the peripheral exposure processing of the opposite edge.
That is, the existing peripheral exposure device also has the following problem: since the movement of the substrate and the movement of the exposure light source are not based on one information source, the peripheral exposure area of the reference side of the substrate is not parallel to the peripheral exposure area of the second column and later, And in extreme cases the light from the peripheral exposure can invade the pattern area
Method used
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[0030]
[0031] Hereinafter, an embodiment of the peripheral exposure apparatus 100 according to the present invention will be described with reference to the drawings. Figure 1A and Figure 1B The overall shape of the periphery exposure apparatus 100 of this invention is shown. Figure 1A is a top view of the peripheral exposure device 100; Figure 1B is its side view.
[0032] The peripheral exposure apparatus 100 is mainly composed of a frame body 11 and a door bracket 21 . A rotary table 14 and an exposure table 15 are provided on the upper surface of the housing 11 , and the substrate SW is placed on the exposure table 15 and fixed by suction. The exposure unit 31 which irradiates ultraviolet light is provided in the door bracket 21, and in this embodiment, three 1st exposure unit 31a, the 2nd exposure unit 31b, and the 3rd exposure unit 31c are provided. In addition, the peripheral exposure device 100 is provided with a main control unit 90 for controlling the devic...
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The invention provides a perimeter exposure method that simplifies aligning working procedure, and can correctly ensure perimeter exposure area parallel to a reference edge. The perimeter exposure method comprises an exposure unit (31) with irradiation ultraviolet light, and exposes perimeter area (EA) surrounding a loop pattern area by utilizing ultraviolet light; the loop pattern area is formedon a rectangle cardinal plate (SW). the method comprises: a retain working procedure (S11) that retains the rectangle cardinal plate on an exposure station; a gradient calculating procedure (S13) that calculates gradient of the cardinal plate in the first direction according to an edge (SN1) of one side of the rectangle cardinal plate (SW) detected by a component (51); a rotate procedure that rotates the rectangle cardinal plate (SW) or the exposure unit (31) based on the calculated gradient result; a drive procedure (S17) that drives the exposure unit (31) and the exposure station relativelyin the first direction; an irradiation procedure (S18) that specifies perimeter area (EA) by detecting edge through the component part (51), and irradiates ultraviolet light from the exposure unit (31).
Description
technical field [0001] The present invention relates to a peripheral exposure device for performing peripheral exposure by irradiating light containing ultraviolet rays to a peripheral region of a pattern region of a substrate. Background technique [0002] After exposing the pattern of a large substrate with an exposure device, it is necessary to expose unnecessary photoresist ink (hereinafter referred to as photoresist) in the peripheral area around the pattern area in advance so that it does not become its Obstacles in subsequent processes. In Patent Document 1 (Japanese Patent No. 3211079 ), peripheral exposure is performed by rotating a light source device capable of adjusting an opening for emitting light around a substrate. This peripheral exposure device does not rotate the substrate, but uniformly exposes the peripheral area by rotating the light source device around the substrate and adjusting the openings for irradiating light. [0003] However, the conventional...
Claims
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IPC IPC(8): G03F7/20
CPCG03F7/2002G03F7/2022G03F7/70425G03F7/70716G03F7/7085G03F7/70516G03F7/706835G03F7/706849G03F7/706851
Inventor 清水诚基
Owner ORC MFG