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Electrostatic clamp, lithographic apparatus and method of manufacturing an electrostatic clamp

A technology of lithography equipment and clamping devices, which is applied in the application of electrostatic attraction holding devices, optomechanical equipment, semiconductor/solid-state device manufacturing, etc.

Active Publication Date: 2012-11-07
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, with regard to the number of pillars, a compromise has to be reached, since the contact pressure due to electrostatic attraction decreases with an increasing number of pillars 7

Method used

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  • Electrostatic clamp, lithographic apparatus and method of manufacturing an electrostatic clamp
  • Electrostatic clamp, lithographic apparatus and method of manufacturing an electrostatic clamp
  • Electrostatic clamp, lithographic apparatus and method of manufacturing an electrostatic clamp

Examples

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Embodiment Construction

[0023] figure 1 A lithographic apparatus according to an embodiment of the invention is schematically shown. The lithographic apparatus comprises: an illumination system (illuminator) IL configured to condition a radiation beam B (e.g. ultraviolet (UV) radiation or extreme ultraviolet (EUV) radiation); a support structure (e.g. mask table) MT, It is configured to support a patterning device (such as a mask) MA and is connected to a first positioning device PM for precisely positioning the patterning device according to determined parameters; a substrate table (such as a wafer table) WT is configured for for holding a substrate (e.g. a resist-coated wafer) W and is connected to a second positioning device PW configured to precisely position the substrate according to determined parameters; and a projection system

[0024] (eg a refractive projection lens system) PS configured to project the pattern imparted to the radiation beam B by the patterning device MA onto a target port...

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PUM

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Abstract

The invention relates to an electrostatic clamp for use in a lithographic apparatus comprising a layer of material provided with burls, wherein an electrode surrounded by an insulator and or a dielectric material is provided in between the burls and a method of manufacturing such an electrostatic clamp. The electrostatic clamp may be used to clamp an object to an object support in a lithographic apparatus.

Description

technical field [0001] The present invention relates to an electrostatic clamping device for holding an object such as a wafer, substrate or reticle in a fixed plane in a lithographic apparatus during use, the clamping device comprising a support provided with burls structure, the tops of the burls define the plane in which the object is held and electrodes surrounded or surrounded by an insulator are disposed between the burls. Background technique [0002] A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually a target portion of the substrate. For example, lithographic equipment may be used in the manufacture of integrated circuits (ICs). In this case, a patterning device, such as a mask, is used to generate the circuit pattern to be formed on the individual layers of the IC. The pattern can be transferred onto a target portion (eg, comprising a portion, one or more dies) on a substrate (eg, a silicon wafer). Typically, the pattern...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/683H01L21/687
CPCG03F7/70708H01L21/6875H01L21/6831H01L21/027H01L21/687H02N13/00
Inventor A·J·C·斯吉本T·A·R·凡埃姆派尔R·维色J·H·G·弗朗森阳宗全A·布拉尔斯A·P·瑞吉普玛
Owner ASML NETHERLANDS BV