Halftone mask and manufacture method thereof
A half-tone mask and half-tone technology, applied in the half-tone mask and its manufacturing field, can solve the rising cost of half-tone mask manufacturing, increase the cost of half-tone mask manufacturing, and the transmittance of the mask is difficult to change and other issues to achieve the effect of reducing manufacturing costs
Inactive Publication Date: 2012-02-29
BOE TECH GRP CO LTD +1
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Problems solved by technology
In order to determine the optimal thickness of the halftone layer, the existing technology usually conducts multiple experiments before production, and constantly adjusts the process parameters according to the feedback of the experimental results. As a result, the manufacturing cost of the halftone mask is sharply increased.
In addition, the transmittance of the reticle is difficult to change after the reticle manufacturing process is completed
Therefore, after the reticle is manufactured, if the transmittance of the halftone layer needs to be changed based on actual process conditions, the existing technology can only remanufacture the reticle according to the specific light transmittance requirements, which further aggravates the halftone reticle manufacturing process. rising costs
Method used
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[0025] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.
[0026] figure 1 It is a schematic structural diagram of the first embodiment of the halftone mask of the present invention. figure 2 for figure 1 Middle A-A' sectional view. Such as figure 1 and figure 2 The shown halftone reticle includes a substrate 1, and a halftone area and an opaque area are arranged on the effective area of the substrate 1, and a halftone area layer 2 for adjusting light transmittance is formed on the halftone area, and the opaque are...
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Abstract
The invention relates to a halftone mask and a manufacture method thereof. The halftone mask comprises a substrate, wherein the substrate comprises an effective area and a non-effective area; the effective area comprises a halftone area, a light-proof area and a completely light transmitting area; the area outside the effective area is the non-effective area; and the halftone area is provided with a halftone area layer used for regulating the transmittance. The halftone area can be used for regulating the transmittance, thus when the transmittance of the mask needs to be adjusted by considering the change of technological condition and other factors, the transmittance of the mask can be regulated through the halftone area without renewedly manufacturing the mask, thereby reducing the production and manufacture cost.
Description
technical field [0001] The invention relates to a half-tone mask and a manufacturing method thereof, in particular to a half-tone mask with adjustable light transmittance and a manufacturing method thereof. Background technique [0002] In order to effectively reduce the cost of Thin Film Transistor Liquid Crystal Display (hereinafter referred to as TFT-LCD) and improve the yield, the manufacturing process of the TFT-LCD array substrate structure is gradually simplified. At present, the 4 mask (4Mask) process is becoming more and more mature, and is gradually being popularized and applied. [0003] One of the core technologies of the 4-pass mask (4Mask) process includes: a half-tone mask technology using a half-tone (Half-tone) reticle. The half-tone mask is to form a thin film with a certain transmittance (ie: half-tone layer) on the part of the traditional mask corresponding to the TFT channel pattern of the array substrate, so that the light passing through the half-tone...
Claims
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IPC IPC(8): G03F1/00G03F1/32
Inventor 郭建周伟峰明星
Owner BOE TECH GRP CO LTD