Preparation method of high-purity nano zirconium dioxide
A nano-zirconium dioxide and zirconium dioxide technology, applied in the direction of zirconia, nano-structure manufacturing, nano-technology, etc., can solve the problems of difficult industrial production, expensive production equipment, harsh process conditions, etc., and achieve easy control and dry processing capacity Larger, less reaction time effects
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Publication Date
- 2010-09-15
- Estimated Expiration
- Not applicable · inactive patent
Smart Images
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Abstract
Description
technical field
[0001] The invention relates to a preparation method of zirconium dioxide, in particular to a preparation method of high-purity nano-scale zirconium dioxide. Background technique
[0002] The current nano-zirconium dioxide (ZrO 2 ) Due to the small particle size, large surface area, and large proportion of surface atoms to the total number of atoms, it has the characteristics of quantum effects, small size effects, surface effects, and macroscopic quantum tunneling effects, which make it derive from traditional solids that do not have Many special properties make it have broad application prospects in catalysis, light filtering, light adsorption, medicine, magnetic media, structural ceramics and new materials. The production of zirconium dioxide has a long history, and there are many preparation methods up to now, but the particle size distribution of the zirconium dioxide powder produced by the current preparation method is wide and high, and there are also...
Examples
Embodiment 1
[0025] Such as figure 1 with figure 2 Shown, the preparation method of high-purity nano zirconium dioxide comprises:
[0026] 1. The preparation of zirconium oxychloride comprises steps:
[0027] Sintering, heating sodium hydroxide flake alkali with a content of 99wt% to 750°C in a sintering pot, adding 80-mesh zircon into the sodium hydroxide solution at a mass ratio of 1:1.3, and cooling the sintering after the materials have completely reacted material, after the reaction, the Si conversion rate is greater than 99.5%;
[0028] Washing with water, the sintered material and water are washed according to the mass ratio of 1:8, three-stage reverse water washing is adopted, the temperature of the washing liquid is 80°C, and the washing is for 1.5 hours, and the washing liquid of each washing is removed by a strong magnetic separator to remove iron and other impurities. It is then used for the next level of washing, the removal of silicon can reach 99wt%, the removal rate of ...
Embodiment 2
[0042] Such as figure 1 with figure 2 Shown, the preparation method of high-purity nano zirconium dioxide comprises:
[0043] 1. The preparation of zirconium oxychloride comprises steps:
[0044] For sintering, heat sodium hydroxide flake alkali with a content of 99wt% to 700°C in a sintering pot, add 80-mesh zircon into the sodium hydroxide solution at a mass ratio of 1:1.5, and cool the materials to obtain sintering after the reaction is complete. material, after the reaction, the Si conversion rate is greater than 99.5%;
[0045] Water washing, the sintered material and water are washed according to the mass ratio of 1:7, three-stage reverse water washing is adopted, the temperature of the washing liquid is 90°C, and the washing is performed for 1 hour, and the washing liquid of each washing is removed by a strong magnetic separator to remove iron and other impurities. It is then used for the next level of washing, the removal of silicon can reach 99wt%, the removal rat...