Transmission mechanism and wet process equipment equipped with same

Abstract

The invention relates to a transmission mechanism and wet process equipment equipped with the same which are used for transmitting a base plate. The transmission mechanism comprises an upper press mechanism, a lower press mechanism and an adjustment mechanism; the upper press mechanism comprises an upper press roller, an upper fixing base and an adjustment device, the upper fixing base is used for fixing the upper press roller, and the adjustment device is used for adjusting the height and the pressure of the upper press roller, is fixed on the upper fixing base and is provided with a press block in contact with the bearing of the upper press roller, at least one elastic component arranged on the press block and a pressure adjustment unit for adjusting the elasticity of the elastic component; the lower press mechanism comprises a lower press roller and a lower fixing base, the lower press roller works together with the upper press roller to clamp and transmit the base plate, and the lower fixing base is used for fixing the lower press roller; and the adjustment mechanism connects the upper fixing base with the lower fixing base and is used for adjusting the height between the upper fixing base and the lower fixing base.

Description

technical field [0001] The present invention relates to a transmission mechanism, in particular to a transmission mechanism with an adjustment device and wet process equipment with the transmission mechanism. Background technique [0002] In the electronic manufacturing industry, especially in the process of manufacturing liquid crystal display panels, it is a common operation process to perform wet chemical treatment on the surface of the substrate, and multiple processes involve wet chemical treatment. The so-called wet chemical treatment refers to the operation process of using chemical solution to etch, deposit thin film or clean the surface of the substrate. For example, the definition of electronic circuits in the manufacture of printed circuit boards and the cleaning steps of circuit boards are wet chemical processes. Wet chemical processing equipment mainly allows the substrate to be carried on the transmission mechanism, and through the transmission system, the sub...

AI Technical Summary

Problems solved by technology

The disadvantage of this fixed roller design is that it is difficult to ensure that the distance between each upper pressure roller 3 and lower pressure roller 4 is the same simply by the weight of the material of the upper pressure roller 3 itself to generate the downward force, or in other words, it is very difficult It is difficult to ensure that the pressure between each upper pressing roller 3 and lower pressing roller 4 is the same, so when this fixed upper and lower roller set transports the substrate 1, either the upper pressing roller 3 and the lower pressing roller 4 cannot contact the substrate 1 at the same time. Without the effect of transmission, the formation of a certain inclination causes the unevenness of the conveying surface to cause the substrate to shift, or because the distance between the upper pressing roller 3 and the lower pressing roller 4 is too small, the pressure applied to the substrate 1 is too large and cause damage

Obviously, the traditional fixed roller design has become increasingly unable to meet the requirements of the modern semiconductor industry

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