Radial verticality detection platform

A verticality, single-wafer technology, applied in the direction of measuring devices, mechanical measuring devices, instruments, etc., can solve problems such as inability to guarantee the centering accuracy of crystal ingots, lack of detection methods, and affect the yield of square ingots, etc.

Inactive Publication Date: 2012-11-14
江苏有则创投集团有限公司
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  • Abstract
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  • Application Information

AI Technical Summary

Problems solved by technology

[0002] At present, most photovoltaic companies have raised their quality requirements to a new level. Cell companies have higher requirements for silicon wafer manufacturing, and the processing of defective silicon wafers has also been reduced from the previous acceptance to chipping and small side lengths. One category, the produced unrolled sheets are not acceptable. There are two sources of unrolled and eccentric: one is the eccentricity during the bonding process of the round rod. Then cut directly on the machine; the second is generated during the line opening process, because the equipment is imported, so the program and operation errors sometimes have an impact
[0003] Round rod bonding is the first process in the silicon wafer manufacturing workshop. The improvement of the yield of silicon wafers must start from this post. Now all photovoltaic companies produce square rods through wire square cutting; so the round rods are bonded to On the crystal support, ensuring the bonding accuracy of the round rod is the first element. After the round rod is bonded, the circular runout is detected by the one-way dial indicator. Therefore, the centering accuracy cannot be guaranteed for the eccentric and inclined crystal rod, which affects the direction. Rod yield

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Embodiment Construction

[0009] The present invention will be described in further detail below in conjunction with the accompanying drawings and embodiments.

[0010] Such as figure 1 , 2 As shown, a single-wafer rod radial perpendicularity detection platform is composed of a base plate 10, a turntable 11, a column 2 with a scale 2-1, a depth measuring ruler 7 and an indexing table 8. The lower end of the column 2 has Base 1, the base 1 is fixed on the base plate 10 through its four positioning holes, the turntable 11 is rotatably supported on the base plate 10 through bearings, the depth measuring ruler 7 is movably installed on the column 2 through the moving sleeve 3, and the depth measurement The ruler 7 is fixed on the moving sleeve 3 through the inner hexagonal bolt 9, the moving sleeve 3 is set on the column 2, the indexing table 8 is movably installed on the column 2 through the table frame moving sleeve 4, and the table rod 6 of the indexing table 8 The pressure plate 5 is fixed on the tab...

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Abstract

The invention relates to a radial verticality detection platform of single crystal pole for detecting the radial verticality of a single-wafer rod in photovoltaic industry. The radial verticality detection platform comprises a bottom plate, (10), a dial (11), a pillar (2) with a calibrated scale (2-1), a depth measuring scale (7) and an indexing table (8), wherein the lower end of the pillar (2) is provided with a base(1); the base (1) is fixed on the bottom plate (10); the dial (11) is rotatably supported on the bottom plate (10); the depth measuring scale (7) and the indexing table (8) are movably arranged on the pillar (2); and the depth measuring scale (7) is arranged below the indexing table (8). The invention not only ensures the vertical precision of the single-wafer rod but also ensures the accuracy of alignment of the single-wafer rod and does not need to detect circular run out for the second time.

Description

technical field [0001] The invention relates to a radial perpendicularity detection platform of a single wafer rod, which is used for detecting the radial perpendicularity of a single wafer rod in the photovoltaic industry. Background technique [0002] At present, most photovoltaic companies have raised their quality requirements to a new level. Cell companies have higher requirements for silicon wafer manufacturing, and the processing of defective silicon wafers has also been reduced from the previous acceptance to chipping and small side lengths. One category, the produced unrolled sheets are not acceptable. There are two sources of unrolled and eccentric: one is the eccentricity during the bonding process of the round rod. After that, it will be directly cut on the machine; the second is that it occurs during the line opening process. Since the equipment is imported, errors in procedures and operations will sometimes have an impact. [0003] Round rod bonding is the fir...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01B5/245
Inventor 林玉往杨阳赵建兴王永平吴伟忠常青
Owner 江苏有则创投集团有限公司
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