Nano manufacturing system

Abstract

The invention discloses a nano manufacturing system, which comprises an atomic particle generating system communicated with a gas source and connected with an atom transport system. The atom transport system is connected with a vacuum working chamber; a nanopore array maskplate is arranged in the vacuum working chamber; an optical alignment system is arranged above the edge of the nanopore array maskplate, and a nano-scale electronic alignment system is arranged below the edge of the nanopore array maskplate; a substrate material is laid below the nanopore array maskplate; gas of the gas source enters the atomic particle generating system to obtain energy and momentum so as to generate atomic particles, the atomic particles enter the vacuum working chamber, and a bracket adjusting controlsystem realizes relative movement of the nanopore array maskplate and the substrate material to realize the masking function and nano graphic processing; and the nano manufacturing system has the characteristics of high control accuracy, small processing scale, small damage to the substrate material, small electric influence, relative simple system structure, variety of functional materials, and convenience of structural graphics.

Description

technical field [0001] The invention belongs to the technical field of nano-processing and manufacturing, and in particular relates to a nano-manufacturing system using a silicon nanohole array as a moving mask and adopting cascade alignment. Background technique [0002] Since the invention of the integrated circuit, the development of new micro-nano planar processing technology for integrated circuits has always been an important research topic and goal in the scientific community. From 1.8um to 90nm, 45nm to the 32nm process technology currently used in practice, integrated circuit micro-nano planar processing technology has experienced continuous challenges, from traditional lithography to immersion lithography, and then to electron beam lithography, scientists and engineers We have overcome many difficulties, but before reaching the 10nm process, there are still 22nm, 14nm and other technical stages that need to be crossed. Traditional immersion lithography has been dif...

AI Technical Summary

Problems solved by technology

However, the traditional ultraviolet optical lithography faces the problem of wavelength diffraction limit after entering the deep nanoscale. Electron beam lithography is currently entering the commercialization stage, but it is still difficult to achieve in terms of its complexity, batching, and the reduction in resolution caused by electron emission. Facing challenges, the same high-energy ion beams also have problems such as charging effects, ion implantation, high-energy damage, etc.

The atomic particle beam processing technology is a promising nanofabrication technology due to its advantages such as the wavelength scale of the De Broglie wave and the small damage and electrical influence. However, it is difficult to achieve breakthroughs due to the difficulty in aligning and controlling atomic particles

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