Alignment table leveling mechanism for proximity contact lithography machine
A technology of lithography machine and workbench, which is applied in the direction of microlithography exposure equipment, photolithography process exposure device, etc., can solve the problems of rubber surface damage, exposure quality impact, thin substrate fragmentation, etc., and achieve stable and reliable performance, Wide application range and easy leveling effect
Inactive Publication Date: 2016-12-14
THE 45TH RES INST OF CETC
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Problems solved by technology
The leveling mechanism currently configured in domestic lithography machines all adopts the traditional hemispherical bowl leveling technology. Due to the relative motion friction of the convex and concave hemispherical bowls, the wear is fast, and the consistency of leveling cannot be guaranteed.
In addition, because the relative motion friction of the two hemispherical bowls during leveling is large, in order to achieve leveling, the contact force between the glued surface of the substrate and the graphic surface of the mask plate must be very large, which is likely to cause damage to the rubber surface, chipping of the thin substrate, and damage to the mask plate. Problems such as large deformation and damage to the mask seriously affect the exposure quality
Method used
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[0016] see Figure 1 ~ Figure 3 , the proximity contact lithography machine is aligned with the leveling mechanism of the workbench, and the connecting plate 7 is used as a force transmission member. There are three holes on the upper circumference of the connecting plate 7, and three upper leveling screws 8 pass through the above three holes. It is connected with the threaded hole on the cylinder body 1, and there is a gap between the connecting plate 7 and the cylinder body 1; three points are set on the lower surface of the connecting plate 7, which are supported by three props 4, and the three props 4 are evenly distributed on the circumference , and installed in the hole on the cylinder body 1 that slides with the top pillar 4; under the three top pillars 4, an elastic airbag 3 is arranged, and the elastic airbag 3 is ring-shaped, and an annular channel is provided to slide with the top pillar 4 The matching holes are connected, and the elastic airbag 3 is arranged in the...
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The invention provides a leveling mechanism for aligning a workbench of a proximity-contact photolithography machine, and relates to the technical field of proximity-contact photolithography equipment. There are three holes on the circumference of the connecting plate, and three upper leveling screws are connected with the threaded holes on the cylinder through the above three holes. There is a gap between the connecting plate and the cylinder; the connecting plate is supported by three top columns. The three top pillars are evenly distributed around the circumference and installed in the holes on the cylinder body that slide and fit with the top pillars; an elastic airbag is arranged under the three top pillars, and the elastic airbag is arranged in the annular channel that communicates with the above-mentioned holes. The cover is fixed on the cylinder body; three cylinders are arranged in the cylinder body, which is a connected type, and there are three locking pistons that can lock the three top columns at the same time; the three cylinders and the elastic air bag are all connected with the air pressure device. The invention has remarkable effects, is easy to level, has small leveling force, and does not damage the mask plate and the glued surface of the substrate during leveling, and meanwhile, has simple structure, stable and reliable performance, and is convenient to use. Wide range of applications.
Description
technical field [0001] The invention relates to the technical field of proximity-contact photolithography equipment, in particular to a leveling mechanism applied to aligning workbenches in proximity-contact photolithography machines. Background technique [0002] The leveling mechanism of the glued surface of the substrate and the graphic surface of the mask plate is the key mechanism in the alignment table of the core components of the lithography machine. This mechanism directly reflects the technical level of the research, production, manufacturing, and assembly of the lithography machine. core technology. The leveling mechanisms of foreign lithography machines are all self-developed, and there is no independent manufacturer selling them worldwide, so it is impossible to buy them. The leveling mechanism currently configured in domestic lithography machines all adopts the traditional hemispherical bowl leveling technology. Due to the large relative motion friction of the...
Claims
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IPC IPC(8): G03F7/20
Inventor 周占福刘玄博甄万财
Owner THE 45TH RES INST OF CETC