Precise motion platform with vibration dampers

A vibration damping device and precision motion technology, applied in the field of motion platforms, can solve problems such as high manufacturing cost and interference, and achieve the effects of reducing manufacturing costs, increasing degrees of freedom, and reducing manufacturing precision requirements

Inactive Publication Date: 2011-10-05
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] There are two deficiencies in the above-mentioned damping device. First, since its cylinder is not subject to any constraints in the circumferential direction, it will produce rotational motion, thereby causing additional d

Method used

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  • Precise motion platform with vibration dampers
  • Precise motion platform with vibration dampers
  • Precise motion platform with vibration dampers

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Embodiment Construction

[0019] In order to better understand the technical content of the present invention, specific embodiments are given together with the attached drawings for description as follows.

[0020] figure 1 Shown is a side-view structure schematic diagram of the precision motion platform of the present invention.

[0021] Such as figure 1 As shown, the precision motion platform includes a micro-motion table 20 , a base 40 , a vibration damping device 30 and a horizontal motor 50 . Base 40 supports the entire precision motion platform. The vibration-damping device 30 is placed between the base 40 and the micro-motion table 20 to play a role of vibration-damping. The vertical motor 60 and the horizontal motor 50 are placed between the base 40 and the micro-motion table 20 to drive the micro-motion table 20 to move vertically and horizontally. The horizontal motor 50 is used to actively control the position or speed of the micro-motion table 20 in the horizontal direction, and the ver...

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PUM

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Abstract

The invention provides a precise motion platform with vibration dampers. The precise motion platform comprises a base, a miscropositioner, vibration dampers, horizontal motors and vertical motors, wherein the number of the vibration dampers is three or more than three, the vibration dampers are positioned between the base and the miscropositioner in a polygon form to support the miscropositioner, the number of the horizontal motors and the vertical motors is respectively three or more than three, and the horizontal motors and the vertical motors are positioned between the base seat and the miscropositioner, and are distributed along a circular path to be staggered with the vibration dampers for actively controlling the position and the speed of the miscropositioner in the horizontal direction and the vertical direction. According to the precious motion platform with the vibration dampers, provided by the invention, the vibration dampers and the motors are separately designed, thereby the design freedom of degree is achieved and the cost is reduced. Aerostatic bearings are applied to the structures of the vibration dampers, and no interval sealing is needed, thereby the requirements on manufacturing accuracy and the manufacturing cost are decreased.

Description

technical field [0001] The invention relates to a motion platform, and in particular to a precision motion platform with a shock absorbing device. Background technique [0002] Precision motion platforms, such as semiconductor exposure equipment, precision testing equipment, etc., include bases and machine loads in their components. The base is fixed to the ground or a platform. The machine load has a mechanical frame that supports the vibration-sensitive parts of the machine, such as the workpiece table, mask table, exposure objective, and some measurement equipment in a lithography machine. Between the base and the machine load is a set of vibration-damping support equipment. Here, there are two main functions of the vibration-absorbing support equipment. One is for support and the other is for damping. [0003] There are many factors that affect the vibration of the base, mainly including the introduction of foundation vibration, the external reaction force and moment...

Claims

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Application Information

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IPC IPC(8): F16M11/18F16M11/22F16F15/02F16C32/06
Inventor 袁志扬周宏权
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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