Low temperature preparation method for TiOF2 photocatalyst film, and application thereof

A photocatalytic thin film, low temperature technology, applied in chemical instruments and methods, physical/chemical process catalysts, chemical/physical processes, etc., can solve the problems of difficulty in forming stable thin films on the surface of substrates, inconvenience in actual production and use, etc. The effect of strong interaction, good stability and wide application prospects
CN102294253BActive Publication Date: 2013-04-17上海万铭环保科技股份有限公司
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
上海万铭环保科技股份有限公司
Publication Date
2013-04-17

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Abstract

The invention discloses a low temperature preparation method for a TiOF2 photocatalyst film. The method comprises the following steps: 1) adding proper amount of titanium tetrafluoride to an organic solvent to prepare a solution A; strongly stirring the solution A for 1-5 hours at a temperature of 283-323 K temperature to obtain a clear precursor solution; 2) dipping and coating the precursor solution on a substrate of glass or ceramic, such that the precursor solution reacts with the substrate; baking for 8-24 hours at the temperature of 313-433 K to obtain the TiOF2 photocatalyst film product. With the present invention, the TiOF2 film is uniformly generated on the surface of the glass or the ceramic through the chemical reactions; the interaction between the film and the substrate is strong, the formed film has good stability, such that the disadvantages of difficulty in forming the stable film on the substrate of the glass or the ceramic at the temperature of 373 K or the requirement of the follow-up baking in the traditional sol-gel method are overcome; the prepared film through the method has wide application prospects in degradation of rhodamine B solution through liquid-phase photocatalysis and air purification.
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Description

technical field

[0001] The present invention relates to a TiOF 2 A low-temperature preparation method for photocatalytic thin films, specifically relating to a method for uniform electroless plating of TiOF on glass and ceramic substrates at low temperatures 2 method for photocatalytic thin films. and applications of such photocatalysts. Background technique

[0002] In recent years, the use of semiconductor photocatalysts to deal with various environmental pollution has attracted the attention of researchers all over the world. Photocatalysts are of great significance in the degradation of organic pollutants and air purification. With the deepening and expansion of research, how to coat photocatalysts on the surface of various substrates has become a bottleneck restricting the wide application of photocatalytic technology. The commonly used coating method is the sol-gel method. This method requires high-temperature roasting, which brings great inconvenience to actual p...

Claims

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