Hard anodization method of mixed acid of copper aluminium alloy
A hard anodic oxidation, copper-aluminum alloy technology, applied in the direction of electrolytic coating, surface reaction electrolytic coating, coating, etc., can solve problems such as production difficulty
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Embodiment 1
[0014] A mixed acid hard anodic oxidation method of copper and aluminum alloys. Aluminum parts are chemically degreased, cleaned, neutralized, cleaned, hard anodized, cleaned, and sealed to obtain a film layer, wherein the electrolyte of hard anodic oxidation The components are as follows: oxalic acid 1g / L, glycerin 1g / L, ascorbic acid 5g / L, benzenesulfonic acid 2g / L; the process parameters of the electrolyte for hard anodic oxidation are as follows: temperature 10°C, voltage: 30V, anode current density: 2.5A / dm 2、 Time: 50min, cathode material: lead plate. The film thickness of this process reaches 50 microns, and the hardness HV is 530.
Embodiment 2
[0016] A mixed acid hard anodic oxidation method of copper and aluminum alloys. Aluminum parts are chemically degreased, cleaned, neutralized, cleaned, hard anodized, cleaned, and sealed to obtain a film layer, wherein the electrolyte of hard anodic oxidation The components are as follows: oxalic acid 2g / L, glycerin 3g / L, ascorbic acid 1g / L, benzenesulfonic acid 3g / L; the process parameters of the hard anodic oxidation electrolyte are as follows: temperature 15°C, voltage: 25V, anode current density: 3.0A / dm 2、 Time: 45min, cathode material: lead plate. The film thickness of this process reaches 48 microns, and the hardness HV is 700.
Embodiment 3
[0018] A mixed acid hard anodic oxidation method of copper and aluminum alloys. Aluminum parts are chemically degreased, cleaned, neutralized, cleaned, hard anodized, cleaned, and sealed to obtain a film layer, wherein the electrolyte of hard anodic oxidation The components are as follows: oxalic acid 5g / L, glycerin 5g / L, ascorbic acid 3g / L, benzenesulfonic acid 1g / L; the process parameters of the electrolyte for hard anodic oxidation are as follows: temperature 13°C, voltage: 25V, anode current density: 3.0A / dm 2、 Time: 40min, cathode material: lead plate. The film thickness of this process reaches 15 microns, and the hardness HV is 620.
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