This invention belongs to the field of
wastewater treatment technology, specifically relating to a method for removing
metallic impurities from acidic
copper-containing
etching wastewater at
room temperature and pressure. The method includes the following steps: S1, adding an oxidant to the acidic
copper-containing
etching wastewater to conduct an oxidation-reduction reaction, obtaining a pretreatment solution; S2, adding
phosphoric acid or soluble
phosphate to the pretreatment solution, adjusting the pH to 1.3-1.7 using a pH adjuster, stirring, and filtering to obtain a purified
copper-containing solution. The method provided by this invention achieves high removal rates for Fe, Ni, Zn, Ca, and Mg, while maintaining a
high copper ion content. It can recycle and regenerate high-purity
copper salt products for application in food,
cosmetics, medical,
electroplating, and other fields, while also reducing
hazardous waste generation, improving economic efficiency, and significantly reducing costs.