Flow field pressure transducer of immersion lithography machine based on PVDF (polyvinylidene fluoride)

Abstract

The invention discloses a flow field pressure transducer of an immersion lithography machine based on PVDF. The transducer comprises a PVDF pressure sensing element containing a shielding film and a signal processing means composed of a voltage amplifier circuit, a charge amplifier circuit and a filter circuit. The PVDF pressure sensing element containing the shielding film generates charge signals which pass through a circuit formed by connection between the output terminal of a charge amplifier and the input terminal of a voltage amplifier, between the output terminal of a voltage amplifierand the input terminal of the filter circuit and between a matching BNC interface of the input terminal of the charge amplifier circuit and an BNC interface of the PVDF pressure sensing element containing the shielding film. The PVDF pressure sensing element containing the shielding film provided in the invention has the characteristics of high sensitivity, low impedance, good flexibility and thelike, is simple and convenient to install and produces little disturbance to a flow field. The signal processing means conditions the charge signals output by the PVDF pressure sensing element to become acquirable voltage signals of -5 to 5 V, and effectively inhibits null drift and noise interference.

Description

technical field [0001] The invention relates to a flow field pressure sensor in an immersion lithography (Immersion Lithography) system, in particular to a flow field pressure sensor based on PVDF (polyvinylidene fluoride) for an immersion lithography machine. Background technique [0002] Modern dry lithography machines use the optical system to accurately project and expose the pattern on the mask on the silicon wafer coated with photoresist, while immersion lithography uses the optical system between the lens group and the silicon wafer on the dry lithography system. A layer of immersion liquid that meets the requirements of optical characteristics is filled in the gap between them, and the refractive index of light waves in this layer of space is increased to increase the numerical aperture of the projection objective lens and the focal depth of the system, thereby achieving the purpose of obtaining a smaller line width. [0003] The immersion lithography technology impr...

AI Technical Summary

Problems solved by technology

[0011] a) The manufacturing process of diffused silicon piezoresistive sensors is complex and expensive (10,000 RMB / piece). When there are many measurement points, the cost of the sensor is high;

[0012] b) Although diffused silicon piezoresistive sensors are easy to miniaturize, the two indicators of sensor volume and sensitivity still restrict each other: when the sensitivity is high and the range is small, the sensor volume is still large and it is difficult to meet the installation requirements; and when the sensor volume is small , its measuring range is much larger than the pressure fluctuation range of the submerged flow field

Therefore, it is difficult to find diffused silicon piezoresistive sensors that meet the requirements of volume and range

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