Vertical Zener diode structure and preparation method thereof
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- SHANGHAI HUA HONG NEC ELECTRONICS
- Publication Date
- 2012-04-11
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The present invention relates to a vertical Zener diode structure. The invention also relates to a preparation method of the vertical Zener diode structure. Background technique
[0002] Traditional Zener diodes are formed by using a ring of N-type implants on the silicon surface surrounded by P-type implants. In the working state of the Zener diode with the above structure, because some carriers in the Zener breakdown will be captured by the silicon surface, the Zener breakdown value will have a relatively large drift, resulting in a reliability problem in the clamping circuit, which is serious. will cause the product to fail. Contents of the invention
[0003] The technical problem to be solved by the present invention is to provide a vertical Zener diode device structure, which can improve the reliability of the Zener diode device.
[0004] In order to solve the above-mentioned technical problems, in the vertical Zener diode structure of the pr...