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Photocurable polysiloxane component and substrate protective film formed by the same

A technology of polysiloxane and light hardening, applied in optics, nonlinear optics, instruments, etc., can solve the problems of poor developability and uneven film thickness, and achieve the effect of good developability and uniform film thickness

Active Publication Date: 2013-06-05
CHI MEI CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although the resin composition has high transparency and can form a protective film with high transparency, it is prone to problems such as poor developability and uneven film thickness during development.

Method used

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  • Photocurable polysiloxane component and substrate protective film formed by the same
  • Photocurable polysiloxane component and substrate protective film formed by the same
  • Photocurable polysiloxane component and substrate protective film formed by the same

Examples

Experimental program
Comparison scheme
Effect test

preparation example 1

[0099] In a three-necked flask with a volume of 500 milliliters, 84 grams (0.7mol) of dimethyldimethoxysilane (abbreviated as DMDMS), 59.4 grams (0.3mol) of phenyltrimethoxysilane (abbreviated as PTMS) and propylene glycol mono Diethyl ether (referred to as PGEE) 180 grams, and while stirring at room temperature, add oxalic acid aqueous solution (0.20 grams of oxalic acid / 30 grams of H 2 O). Next, immerse the flask in an oil bath at 30°C and stir for 30 minutes, then raise the temperature of the oil bath to 120°C within 30 minutes, and when the internal temperature of the solution reaches 105°C, continue heating and stirring for polycondensation for 2 hours. Polysiloxane polymer (A-1) was obtained. During the reaction, 73 grams and 17 grams of by-products such as methanol and water were distilled off respectively.

preparation example 2

[0101] In a three-necked flask with a capacity of 500 ml, 84 grams (0.7 mol) of dimethyldimethoxysilane, 59.4 grams (0.3 mol) of phenyltrimethoxysilane and 180 grams of propylene glycol monoethyl ether were added, and at room temperature While stirring, add oxalic acid aqueous solution (0.3 g oxalic acid / 30 g H 2 O). Next, immerse the flask in an oil bath at 30°C and stir for 30 minutes, then raise the temperature of the oil bath to 120°C within 30 minutes, and when the internal temperature of the solution reaches 110°C, continue heating and stirring for polycondensation for 3 hours. Polysiloxane polymer (A-2) was obtained. During the reaction, 73 grams and 18 grams of by-products such as methanol and water were distilled off respectively.

preparation example 3

[0103]In a three-necked flask with a volume of 500 ml, add 72 grams (0.6 mol) of dimethyldimethoxysilane, 88.8 grams (0.37 mol) of phenyltriethoxysilane (abbreviated as PTES), and "DMS-S27" 540 grams (0.03mol) and 180 grams of propylene glycol monoethyl ether, and while stirring at room temperature, add oxalic acid aqueous solution (0.20 grams of oxalic acid / 30 grams of H 2 O). Next, immerse the flask in an oil bath at 30°C and stir for 30 minutes, then raise the temperature of the oil bath to 120°C within 30 minutes, and when the internal temperature of the solution reaches 105°C, continue heating and stirring for polycondensation for 2 hours. Polysiloxane polymer (A-3) was obtained. During the reaction, 57 grams, 48 ​​grams and 26 grams of by-products such as methanol, ethanol and water were distilled off respectively.

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Abstract

The invention relates to a photocurable polysiloxane component and a substrate protective film formed by the same, wherein the photocurable polysiloxane component comprises polysiloxane polymer (A), naphthoquinonediazido sulfonate ester (B) and solvent (C); by testing a molecular weight distribution of the polysiloxane polymer (A) in a gel penetration chromatographic analysis, taking signals whose molecular weights are 500-50,000 as integers and drawing the molecular weights and accumulated percentages by weight, an integer-molecular weight distribution curve is obtained; the polysiloxane polymer (A) whose molecular weight is more than 800 takes up less than 30% and the polysiloxane polymer (A) whose molecular weight is 500-2,000 takes up 35-60%. The invention further provides a protective film formed by coating the photocurable polysiloxane component on a substrate, prebaking, exposing, developing and post-baking, and an element having the protective film. The photocurable polysiloxane component of the invention has the characteristics of good developing performance and uniform film thickness, etc.

Description

technical field [0001] The present invention relates to a photocurable composition and a film formed therefrom, in particular to a flattening substrate suitable for forming a liquid crystal display (LCD), an organic electroluminescence display (Organic Electro-luminescene Display), etc. A photocurable polysiloxane composition for a protective film such as a film, an interlayer insulating film, or a core material or a cladding material of an optical waveguide, a protective film formed of the photocurable polysiloxane composition, and a photocurable polysiloxane composition having elements of this protective film. Background technique [0002] In recent years, as display devices such as liquid crystal displays and organic electroluminescent displays hope to obtain higher resolution and high-definition image quality, most of the industry currently adopts methods of increasing the aperture ratio of display devices to meet this requirement. need. Japanese Patent Application Lai...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02F1/1333H01L27/32C08L83/047C08K5/42
Inventor 吴明儒施俊安
Owner CHI MEI CORP
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