Two-workpiece-platform rotary exchange method and device based on cable-box anti-rotation mechanisms

Abstract

The invention discloses a two-workpiece-platform rotary exchange method and a device based on cable-box anti-rotation mechanisms, belonging to the technology of semiconductor manufacturing equipment. The device comprises two workpiece platforms, a rotary switching platform and two cable-box anti-rotation devices, wherein in the rotary exchange process of the two workpiece platforms, the rotary switching platform clamps the two workpiece platforms and rotates around the center of a base platform so as to realize exchange of an exposure station and a preprocessing station; and the cable-box anti-rotation mechanisms control self rotation of the two workpiece platforms so as to guarantee the same phase of the two workpiece platforms in the platform exchange process. The device in the invention can be used for solving the problems of large impact torque and more platform exchange steps in the existing linear platform exchange scheme and phase reverse of the two workpiece platforms, cable winding and target missing of a laser interferometer and the like in the existing rotary platform exchange scheme, and adopts a smaller weight balancing system so as to be beneficial to shortening the balance time; and simultaneously the system is simplified, the cost is reduced, the platform exchange steps are reduced, the platform exchange time is shortened, and the yield of photoetching machines is effectively improved.

Description

technical field [0001] The invention belongs to the technical field of semiconductor manufacturing equipment, and mainly relates to a method and device for rotating and exchanging double workpiece tables based on a cable box anti-rotation mechanism. Background technique [0002] Lithography machine is one of the important ultra-precision equipment in the manufacture of very large scale integrated circuits. The resolution and engraving accuracy of the lithography machine determine the minimum line width of the integrated circuit chip. At the same time, the yield of the lithography machine greatly affects the production cost of the integrated circuit chip. As the key subsystem of the lithography machine, the workpiece table It also determines the resolution, overlay accuracy and productivity of the lithography machine to a large extent. [0003] Productivity is one of the main goals of lithography machine development. Under the condition of satisfying the resolution and over...

AI Technical Summary

Problems solved by technology

At the same time, it solves a series of problems such as the phase inversion of the cable table, the winding of the cable table cable, the loss of the target of the laser interferometer, the large radius of gyration, and the large moment of inertia.

The present invention can also solve the problems of large impact torque and many beats in the existing linear channel change scheme, and can adopt a smaller mass balance system, which is beneficial to shorten the balance time, simplify the system at the same time, reduce costs, and shorten the cycle time of channel change. It takes less time to change the platform, which can effectively improve the productivity of the lithography machine

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