Low-gloss and scratch-resistant polypropylene material and preparation method thereof
A polypropylene material and scratch-resistant technology, which is applied in the field of low-gloss scratch-resistant polypropylene material and its preparation, can solve the problems of reducing gloss and achieve the effects of reducing gloss, simple preparation process, and good scratch resistance
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0040] The main components of the low-gloss scratch-resistant polypropylene material of the present invention include 89.2% block polypropylene SP179, 5% toughening agent POE, 4% silica masterbatch, 0.1% antioxidant 1010, and 0.2% antioxidant 168 , 0.1% antioxidant DSTP, 0.2% light stabilizer 944, 0.2% light stabilizer 770, and 1% black masterbatch.
Embodiment 2
[0042] The main components of the low-gloss and scratch-resistant polypropylene material of the present invention include 85.2% block polypropylene SP179, 5% toughening agent POE, 8% silica masterbatch, 0.1% antioxidant 1010, 0.2% antioxidant 168 , 0.1% antioxidant DSTP, 0.2% light stabilizer 944, 0.2% light stabilizer 770, and 1% black masterbatch.
Embodiment 3
[0044] The main components of the low-gloss and scratch-resistant polypropylene material of the present invention include 81.2% block polypropylene SP179, 5% toughening agent POE, 12% silica masterbatch, 0.1% antioxidant 1010, 0.2% antioxidant 168 , 0.1% antioxidant DSTP, 0.2% light stabilizer 944, 0.2% light stabilizer 770, and 1% black masterbatch.
PUM
Property | Measurement | Unit |
---|---|---|
melt flow index | aaaaa | aaaaa |
density | aaaaa | aaaaa |
melt flow index | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com