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A diamond nanopit array and its preparation method
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A nano pit and diamond technology, applied in the field of diamond nano structure and its preparation, can solve the problems of uneven size and distribution of etching pits, and achieve the effects of improving surface pollution, low cost and simple operation.
Inactive Publication Date: 2014-10-08
JILIN UNIV
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During the growth process of diamond single crystal, under hydrogen plasma atmosphere, it will be etched to produce a pit structure. This pit structure is generally used in electrochemistry, etc., but the size and distribution of etching pits under this condition are not uniform.
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Embodiment 1
[0024] For the specific implementation process of the diamond nanopit array of this embodiment, see figure 1 .
[0025] Step 1, the cleaning of the diamond surface.
[0026] Put the HPHT Ib(100) diamond single crystal into concentrated sulfuric acid and concentrated nitric acid for cooking (concentrated sulfuric acid by volume: concentrated nitric acid=1~2:2~1.), then use acetone, alcohol ultrasonic cleaning, nitrogen blow dry use.
[0027] The second step is to coat the diamond surface with a gold film.
[0028] Using the ion sputtering method, put the cleaned diamond into the vacuum chamber, turn on the mechanical pump, wait for the vacuum to reach 5-7Pa, and then pass in argon gas to stabilize the pressure at 12-13Pa. Turn the high-pressure adjustment knob to adjust the gold target. The voltage is 1400V, sputtering for 8-10 seconds.
[0029] Step 3, plasma etching.
[0030] The diamond single crystal covered with the gold film is placed on the sample holder in the vacu...
Embodiment 2
[0033] The specific steps are the same as in Example 1, except that the flow of oxygen is reduced. The flow rate of oxygen is 6 sccm, the etching is carried out for 60 seconds under the conditions of a pressure of 3 kPa and a microwave power of 200 W. Diamond nanopit arrays can also be obtained, but the etching rate is lower than that of Example 1.
Embodiment 3
[0035] Concrete steps are the same as embodiment 1, increase the flow rate of oxygen. The flow rate of oxygen is 15 sccm, the etching is carried out for 60 seconds under the conditions of a pressure of 3 kPa and a microwave power of 200 W. Diamond nanopit arrays can also be obtained, and the etching rate is larger than that of Example 1.
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Abstract
The invention provides a diamond nanometer pit array and a preparation method thereof, which belong to the technical field of diamond nanometer structures. The diamond nanometer pit array is formed in such a way that the (100)-surface diamond monocrystalline surface is etched into nanometer pits with average density of 0.5x109-1.5x109cm-2; longitudinal sections of the nanometer pits are of inverted trapezoidal shapes; pit openings are 80-150 nanometers wide; and diamond nanometer particles can be placed in the pits. The preparation method comprises the following steps of: cleaning the diamond monocrystalline surface; sputtering a diamond film on the diamond monocrystalline surface by an ion sputtering method; and etching the diamond monocrystalline coated with the diamond film by a microwave excitation oxygen plasma. The diamond nanometer pit array and the preparation method thereof, provided by the invention, have the advantages of simplicity in operation, low cost, large-area production feasibility, safety and no pollution of etching gases as well as the like; a stable base is provided to the diamond nanometer particles through the combination of wide application of the nanometer diamond and excellent property of the diamond; and problems that diamond nanometer particles are easy to be aggregated in the application and surface pollution is caused to the adding of the stabilizing agent can be solved.
Description
technical field [0001] The invention belongs to the technical field of diamond nanostructures and their preparation, and relates to a diamond nanopit array structure prepared on a diamond single crystal substrate by using oxygen plasma etching, and one or more gold nanoparticles can be placed in the pits Structure. Background technique [0002] Diamond has excellent physical and chemical properties, and has broad application prospects in the fields of mechanical processing, microelectronics, optics and electrochemistry. However, the potential applications of materials are not only related to their inherent properties, but also depend on the design of the material surface. In recent years, the preparation of different nanostructures of diamond has attracted the attention of researchers in various fields, such as diamond nanocones, nanowires, nanorods, etc. Therefore, it is necessary to continuously explore new diamond structures to broaden the application range of diamond. ...
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