Continuous pressurizing device
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
- Publication Date
- 2014-07-30
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention relates to fluid static pressure technology, in particular to a continuous pressurizing device which can continuously and accurately apply fluid static pressure in a cryostat. Background technique
[0002] As an effective experimental method for studying semiconductor materials, hydrostatic pressure technology is widely used in the research fields of optical properties, electrical properties, and phase transitions of semiconductors. Applying hydrostatic pressure requires a diamond-to-anvil arrangement. The principle of the diamond counter-anvil device is to place the sample in a pressure chamber formed by two opposite diamonds and spacers whose upper and lower anvil surfaces are parallel, fill the pressure chamber with a pressure transmission medium, and push the two diamonds to make them mutually When extruding, through the pressure transmission medium, hydrostatic pressure will be generated on the sample. The diamond anvil technology ...