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Imaging device and imaging device

A technology of imaging devices and imaging characteristics, applied in electric solid state devices, semiconductor devices, radiation control devices, etc., can solve problems such as characteristic differences, and achieve the effect of suppressing inhomogeneity

Active Publication Date: 2016-08-03
SONY SEMICON SOLUTIONS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0007] For example, in the case of a solid-state imaging device, this dividing line appears on a straight line, causing a significant difference in characteristics

Method used

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  • Imaging device and imaging device
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  • Imaging device and imaging device

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Experimental program
Comparison scheme
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Embodiment Construction

[0049] Embodiments of the present invention will be explained below. It should be noted that the exposition is divided into two topics in the following order.

[0050] 1. First embodiment (imaging device)

[0051] 2. The second embodiment (imaging device)

[0052] 1. First embodiment (imaging device)

[0053] Inhomogeneity of imaging characteristics

[0054]First, non-uniformity in imaging characteristics will be explained.

[0055] figure 1 is an explanatory diagram showing a typical CMOS (Complementary Metal Oxide Semiconductor) image sensor 10 . figure 1 The illustrated CMOS image sensor 10 is a solid-state imaging device made of CMOS. The CMOS image sensor 10 includes a plurality of pixels each including a photodiode for converting light incident thereto into signal charges which are then amplified and propagated in the pixel.

[0056] figure 1 The illustrated CMOS image sensor 10 is a sensor with a large chip size (eg 35 mm). In the process of fabricating the CMO...

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PUM

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Abstract

The invention discloses an imaging device and an imaging device. The imaging device includes at least one special pixel, and the layout of the structure of the special pixel is made different from the layout of the structures of other pixels except the special pixel. The special pixel is a pixel whose imaging characteristic is stably different from that of the other pixels. The layout difference between the structure of the special pixel and the structures of the other pixels is used to suppress the inhomogeneity of the imaging characteristic exhibited by the special pixel. The imaging device and imaging apparatus of the present invention can suppress unevenness in imaging characteristics.

Description

[0001] Cross-References to Related Art [0002] The present invention encompasses subject matter related to that disclosed in Japanese Priority Patent Application JP2011-147932 filed with Japan Patent Office on Jul. 4, 2011, the entire contents of which are hereby incorporated by reference into this article. technical field [0003] In general, the present invention relates to imaging devices and imaging devices. More specifically, the present invention relates to an imaging device capable of suppressing local unevenness of its own imaging characteristics and an imaging device employing the imaging device. Background technique [0004] In recent years, improvements in semiconductor manufacturing technology have allowed progress in the miniaturization of semiconductor devices and allowed the size of semiconductor device chips to increase. In addition, the size of the masked circuit is also increased. For example, the number of pixels contained in an imaging device housed i...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L27/146H04N5/225H04N5/374
CPCH01L27/14607H01L27/14636H01L27/14643H01L27/14623H04N23/62H04N25/585H04N25/704H04N25/702
Inventor 石井俊辅
Owner SONY SEMICON SOLUTIONS CORP